2016
DOI: 10.1103/physrevb.93.214408
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Influence of the sputtering flow regime on the structural properties and magnetic behavior of Fe-Ga thin films (Ga ∼ 30 at.%)

Abstract: In this paper we analyze the structure of Fe-Ga layers with a Ga content of ∼30 at.% deposited by the sputtering technique under two different regimes. We also studied the correlation between the structure and magnetic behavior of the samples. Keeping the Ar pressure fixed, we modified the flow regime from ballistic to diffusive by increasing the distance between the target and the substrate. X-ray diffraction measurements have shown a lower structural quality when growing in the diffusive flow. We investigate… Show more

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Cited by 15 publications
(76 citation statements)
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“…We have always found this easy axis along the reference direction that corresponds to the vapor beam direction (Figure ). This is in agreement with previous works in which samples have also been sputtered in the oblique incidence …”
Section: Resultssupporting
confidence: 94%
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“…We have always found this easy axis along the reference direction that corresponds to the vapor beam direction (Figure ). This is in agreement with previous works in which samples have also been sputtered in the oblique incidence …”
Section: Resultssupporting
confidence: 94%
“…The absence of such halo around 32° can be taken as indication of the stoichiometry of our Tb 33 Fe 67 layers. A similar broad halo around 27° can be observed in the XRD patterns of sputtered Fe‐Ga layes with a similar Ga content . We can therefore correlate this broad halo around 27° to the presence of a disordered phase in the Fe‐Ga layers.…”
Section: Resultssupporting
confidence: 75%
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