2012
DOI: 10.1149/2.040212jes
|View full text |Cite
|
Sign up to set email alerts
|

Influence of the Memory Effect on X-ray Photoelectron Spectroscopy and Raman Scattering in Positive Electrode of Ni-MH Batteries

Abstract: The influence of the memory effect on X-ray diffraction, X-ray photoelectron spectroscopy and Raman scattering in the positive electrodes of the nickel metal hydride batteries were investigated. The obtained data of X-ray diffraction, X-ray photoelectron spectroscopy and Raman scattering in the samples shown the memory effect are hardly affected during the charge-discharge processes. The peak intensity of the Raman mode due to the defect of the crystal structure in the samples shown the memory effect is larger… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1

Citation Types

0
10
0

Year Published

2015
2015
2019
2019

Publication Types

Select...
5
1

Relationship

0
6

Authors

Journals

citations
Cited by 9 publications
(10 citation statements)
references
References 36 publications
(52 reference statements)
0
10
0
Order By: Relevance
“…Magnetic susceptibility (MS) measurements can be used to monitor the evolution of the count and size of metallic Ni-clusters embedded in the surface oxide [26,34,35]. Both X-ray photoelectron spectroscopy (XPS) [36][37][38][39][40] and Auger electron spectroscopy (AES) [41] have been used to study the surface composition, with the former being able to identify the oxidation state. The acoustic emission (AE) technique has also been used to study the volume change and pulverization of the MH alloy [42,43].…”
Section: Experimental Methods Used In Failure Analysismentioning
confidence: 99%
See 1 more Smart Citation
“…Magnetic susceptibility (MS) measurements can be used to monitor the evolution of the count and size of metallic Ni-clusters embedded in the surface oxide [26,34,35]. Both X-ray photoelectron spectroscopy (XPS) [36][37][38][39][40] and Auger electron spectroscopy (AES) [41] have been used to study the surface composition, with the former being able to identify the oxidation state. The acoustic emission (AE) technique has also been used to study the volume change and pulverization of the MH alloy [42,43].…”
Section: Experimental Methods Used In Failure Analysismentioning
confidence: 99%
“…Fourier transform infrared spectroscopy (FTIR) has been used to study the OH´ligand in Ni(OH) 2 [44][45][46][47]. Raman spectroscopy (RS) is another optical measurement used to characterize the changes in the separator and positive electrode [37,[46][47][48]. Electrochemical impedance spectroscopy (EIS) or AC impedance measurements are usually used to isolate components with different degrees of degradation [49][50][51][52].…”
Section: Experimental Methods Used In Failure Analysismentioning
confidence: 99%
“…For the Ni 2p XPS spectra (Figure 3f), pristine Ni(HCO 3 ) 2 hollow spheres showed a single Ni 2p 3/2 peak at 856.4 eV, while the first charged sample had three Ni 2p 3/2 peaks at 850.4, 856.4, and 858.6 eV, which can be attributed to Ni, Ni 2+ , and Ni 3+ , respectively. 29 For the 10th charged sample, there were only two Ni 2p 3/2 peaks at 850.4 eV (Ni) and 858.8 eV (Ni 3+ ). Overall, the contributions from the further oxidation of Ni 2+ into Ni 3+ and the reversible reactions between HCO 3 − and Li x C 2 (x = 0, 1, or 2) should be invoked to calculate the new theoretical capacity of Ni(HCO 3 ) 2 , yielding 1928 mAh g −1 (n = 13 at x = 2).…”
mentioning
confidence: 94%
“…The additional reaction in HCO 3 – could be also proved by the capacity of Ni­(HCO 3 ) 2 being higher than that of NiO hollow spheres at 1000 mA g –1 (Figure S11). For the Ni 2p XPS spectra (Figure f), pristine Ni­(HCO 3 ) 2 hollow spheres showed a single Ni 2p 3/2 peak at 856.4 eV, while the first charged sample had three Ni 2p 3/2 peaks at 850.4, 856.4, and 858.6 eV, which can be attributed to Ni, Ni 2+ , and Ni 3+ , respectively . For the 10th charged sample, there were only two Ni 2p 3/2 peaks at 850.4 eV (Ni) and 858.8 eV (Ni 3+ ).…”
mentioning
confidence: 98%
“…S4, † which are corresponding to Ni(OH) 2 and NiOOH. 48 Again, this result demonstrates the oxidation of NiCl 2 to form nickel oxyhydroxide and nickel hydroxide. Based on the above preliminary test, this V 4+ -catalyzed electroless deposition presents an enormous potential in transition metal oxide deposition.…”
Section: Ruo 2 Suspensions and Deposition On Tio 2 Nanowiresmentioning
confidence: 87%