Influence of the ion energy on generation and properties of thin barrier layers deposited in a microwave plasma process

Ramisch, E.

doi:10.18419/opus-1984

2012

DOI: 10.18419/opus-1984

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Influence of the ion energy on generation and properties of thin barrier layers deposited in a microwave plasma process

E. Ramisch¹

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Influence of the ion energy on generation and properties of thin barrier layers deposited in a microwave plasma process

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