Influence of the Interatomic Potential and the Elastic Scattering Cross‐Section Approximation on the Spatial Distribution of Implanted Ions

Abstract

The elastic scattering cross-sections are calculated both in the framework of Lindhard wideangle extrapolation method and on the basis of an exact solution of the classical equation of motion of a particle in a central-force potential. Using a direct method for the numerical solution of integro-differential equations governing the ion implantation spatial distribution parameters, the projected ranges, projected and lateral stragglings, and skewnesses are calculated in a wide interval of reduced energies. It is shown that for incident energies E < 0.1 all these parameters are affected by the choice of both the interatomic potential and elastic scattering cross-section approximation.PaccwiTbmamTcR ceveHnR ynpyroro paccemmrr KaK B p a m a x nuHnxapnoBcKoii an-npoKcmarpm Ha 6 o n~r u~e YrJIbI, T a K II c noMoubm Toworo pewems maccmecKoro YPaBHeHElR nBUmeHllH YaCTUqbI B UeHTpaJIbHOM CUJIOBOM none. MCnOJIb3yH pa3pa60TaH-HbIM aBTOpaMH IIPHMOB YUCJIeHHbIfi MeTOA PeIIIeHMR IIHTerpO-AIIQ)Q)epe€I~IIanbHbIX ypa-THPOBaHHOfi IlpHMeCH, PaCCsHTaHbI ItpOeKTIIBHble npo6era, IlpOAOJIbHbIe kI IlOtIepesHbIe pas6pocb1 npo6e1-OB M aCllMMeTpllll B IIIMPOKOM HHTepBaJIe npllBeAeHHbIX 3HepTHfi. nOKa3aH0, 9 T O ~b160p KPH MeHlaTOMHOrO IIOTeHUHaJIa, TaK EI ~~U~J I H~~H U H , B KOTOPOM BHeHdi, onzicbmam~nx napaMeTpM npocTpaHcTseHrxoro pacnpeaeaeaarr HoHHo-HMnaaH-paccwTbIBanocL ceqeme ynpyroro pacceaHm BJIHReT Ha Bce napaMeTpbi pacnpene-neHm npm & < 0 , l .

Computer Modeling of Depth Distribution of Vacancy Nanoclusters in Ion-Irradiated Materials

“…Observations depths were found according to spatial distribution tables of ion-implanted impurities [7]. Further interaction sections calculation was made by Rutherford's equation [1].…”

“…Important factors in their properties formation are the crystalline grid nanodefects arising, in particular, in case of irradiation. Production of high-quality, dense metal films and substrate coverings can be implemented by ion beam irradiation [7,8]. Such materials search and development are based on clear understanding of radiation nanodefects creation mechanisms [9].…”