2004
DOI: 10.1149/1.1803562
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Influence of the Chemical Composition and Electronic Structure of Passive Films Grown on 316L SS on Their Transient Electrochemical Behavior

Abstract: Modifications of the passive film formed on 316L stainless steel (SS) in acidic media were performed under dc or ac polarization. The effects of these ageing treatments on the chemical composition and the electronic structure of the passive film were studied. Chemical analysis with angle resolved X-ray photoelectron spectroscopy revealed that ageing induces a net enrichment in chromium oxide in the inner part of the passive film and an increase of the thickness of the inner oxide. Semiconducting behavior of th… Show more

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Cited by 72 publications
(58 citation statements)
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“…Both these values are larger than the oxide film thickness usually reported for passive iron (3 ~ 5 nm), nickel (2 ~ 3 nm), chromium and stainless steels (2 ~ 3 nm) in different solutions before the onset of the transpassive region, [51][52][53][54][55][56] so that the hypothesis of SC space charge width much lesser than the thickness of SC could be untenable and the electrical equivalent circuit of the junction should be modified by adding a further capacitance in parallel with the C SC term which accounts for the metal contribution to the total stored charge. 57 On the other hand donor or acceptor concentration larger than 10 20 ~ 10 21 cm -3 for passive films on iron, nickel and stainless steel have been reported [58][59][60][61][62][63][64][65][66] and up to 10 22 cm -3 in some chromium carbon steel. 67 At such high level of donor or acceptor concentration the applicability of classical M-S theory to the study of a degenerate (or strong impurity metal 68 ) semiconductor/electrolyte interface is open to serious doubts.…”
Section: Location Of Characteristic Energy Level In C-semiconductor/ementioning
confidence: 99%
“…Both these values are larger than the oxide film thickness usually reported for passive iron (3 ~ 5 nm), nickel (2 ~ 3 nm), chromium and stainless steels (2 ~ 3 nm) in different solutions before the onset of the transpassive region, [51][52][53][54][55][56] so that the hypothesis of SC space charge width much lesser than the thickness of SC could be untenable and the electrical equivalent circuit of the junction should be modified by adding a further capacitance in parallel with the C SC term which accounts for the metal contribution to the total stored charge. 57 On the other hand donor or acceptor concentration larger than 10 20 ~ 10 21 cm -3 for passive films on iron, nickel and stainless steel have been reported [58][59][60][61][62][63][64][65][66] and up to 10 22 cm -3 in some chromium carbon steel. 67 At such high level of donor or acceptor concentration the applicability of classical M-S theory to the study of a degenerate (or strong impurity metal 68 ) semiconductor/electrolyte interface is open to serious doubts.…”
Section: Location Of Characteristic Energy Level In C-semiconductor/ementioning
confidence: 99%
“…Based on MottSchottky theory, [28] the capacitance of the Helmholtz layer (C H ) can be neglected. [29] The capacitances of n-type semiconductors were given by Eq. (1),…”
Section: Electrochemical Measurementsmentioning
confidence: 99%
“…El análisis de MottSchottky (Figura 7) indica un comportamiento lineal con una pendiente característica de óxidos semiconductor tipo n en el rango de potenciales entre -0,45 V a 0,10 V. Los defectos puntuales dentro de la película pasivante pueden ser especies metálicas intersticiales o vacancias de oxígeno, o ambas. Una segunda pendiente puede ser atribuida a una distribución no homogénea de dopaje en los semiconductores, a la presencia de estados de interfaciales o a un segundo estado donor o a una distribución de estados donores sobre el bandgap [14,15]. El valor de potencial de banda plana, E bp , es aproximadamente igual a -0,45 V, para todas las muestras.…”
Section: Probeta C Siunclassified