Influence of Ta/sub 2/O/sub 5/ crystallization on the performance of capacitors for high-density DRAMs

Furukawa, R.; Kanda, Neetu; Yamamoto, Hiroyuki; Yoshida, Takeshi; Yamagami, N.; Uemura, T.; Honma, Tsuyoshi; Kanai, Masaki; Kunitomo, M.; Takahashi, Masaru; Uchiyama, Hiroyuki; Ohji, Y.

doi:10.1109/issm.1999.808783

1999 IEEE International Symposium on Semiconductor Manufacturing Conference Proceedings (Cat No.99CH36314)

DOI: 10.1109/issm.1999.808783

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Influence of Ta/sub 2/O/sub 5/ crystallization on the performance of capacitors for high-density DRAMs

R. Furukawa

Neetu Kanda²,

Hiroyuki Yamamoto³

et al.

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Influence of Ta/sub 2/O/sub 5/ crystallization on the performance of capacitors for high-density DRAMs

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