Influence of Substrate Temperature on Microstructure of Zirconium Silicon Nitride Thin Films Deposited by Reactive Magnetron Sputtering
F.S. Oliveira,
I.L. Dias,
P.L.L. Araújo
et al.
Abstract:Zr-Si-N thin films were co-deposited by reactive magnetron sputtering to verify the influence of silicon content (1.6 and 8.0 at. % Si) and substrate temperature (room temperature and heated to 973 K) on structure, morphology, chemical bonds and hardness. GAXRD shows a change in grain orientation from ( 111) to ( 200) due substrate heating for sample Zr 0.984 Si 0.016 N, furthermore, it was not possible to identify any silicon compounds in all deposited samples. SEM-FEG images show greater roughness and surfac… Show more
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