2021
DOI: 10.1016/j.jallcom.2021.160169
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Influence of substrate temperature on delafossite CuFeO2 films synthesized by reactive magnetron sputtering

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Cited by 13 publications
(2 citation statements)
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“…This shows the width of the band associated with the disorder. The values are consistent with values reported previously for sputtered delafossite thin films deposited at 380 °C [ 57 ] or in TiO 2 [ 58 ]. It is shown that the disorder values increase when the nanoparticles are introduced in proximity to the surface, in relative agreement with the micro-strain and dislocation evolutions.…”
Section: Resultssupporting
confidence: 92%
“…This shows the width of the band associated with the disorder. The values are consistent with values reported previously for sputtered delafossite thin films deposited at 380 °C [ 57 ] or in TiO 2 [ 58 ]. It is shown that the disorder values increase when the nanoparticles are introduced in proximity to the surface, in relative agreement with the micro-strain and dislocation evolutions.…”
Section: Resultssupporting
confidence: 92%
“…CuFeO 2 thin film has been considered as a one-size-fits-all electrode in these application devices. It has been synthesized via various deposition techniques such as sputtering [2,[20][21][22], pulsed laser deposition [23][24][25], sol-gel based spin coating [1,26,27], hydrothermal method [19,28], electrodeposition [9,[29][30][31] and spray pyrolysis [3,32,33]. Among these deposition techniques, the electrodeposition is an advantageous method for fabrication of high-quality CuFeO 2 thin film.…”
Section: Introductionmentioning
confidence: 99%