2019
DOI: 10.21272/jnep.11(4).04003
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Influence of Substrate Temperature on the Formation of Titanium Carbide Film

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Cited by 3 publications
(5 citation statements)
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“…The Williamson-Hull curve confirms these errors, resulting in a relative deformation of the network . by Thermionic Vacuum Arc (TVA) Technology It can be observed that in the case of samples A5 and A7 with the same thickness of Ti layers (20nm) the increaase of the substrate temperature from room temperature (sample A5) to 300°C (sample A7) causes a passage from predominant hexagonal Ti phase (sample A5) to a cubic TiC and hexagonal Ti mixture of phases (sample A7) This observation is in agreement with reference [6] were is studied the effect of synthesis condition on the formation of the TiC phase on Si substrate by DC magnetron ion-plasma sputtering of combined graphite/titanium target. The authors show that increase of temperature allows to synthesized films with stoichiometry that coincid with that of TiC.…”
Section: Tem Measurementssupporting
confidence: 86%
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“…The Williamson-Hull curve confirms these errors, resulting in a relative deformation of the network . by Thermionic Vacuum Arc (TVA) Technology It can be observed that in the case of samples A5 and A7 with the same thickness of Ti layers (20nm) the increaase of the substrate temperature from room temperature (sample A5) to 300°C (sample A7) causes a passage from predominant hexagonal Ti phase (sample A5) to a cubic TiC and hexagonal Ti mixture of phases (sample A7) This observation is in agreement with reference [6] were is studied the effect of synthesis condition on the formation of the TiC phase on Si substrate by DC magnetron ion-plasma sputtering of combined graphite/titanium target. The authors show that increase of temperature allows to synthesized films with stoichiometry that coincid with that of TiC.…”
Section: Tem Measurementssupporting
confidence: 86%
“…In reference [6] is studied the effect of synthesis conditions on the formation of titanium carbide phase on silicon surfaces by DC magnetron ion-plasma sputtering of combined graphite/titanium target. The X-ray diffraction analysis and Raman spectroscopy showed that the structure of titanuium carbide films depend on the substrate temperature.…”
Section: Introductionmentioning
confidence: 99%
“…It can be observed that in the case of samples A5 and A7 with the same thickness of Ti layers (20 nm) the increase of the substrate temperature from room temperature (sample A5) to 300 °C (sample A7) causes a passage from predominant hexagonal Ti phase (sample A5) to a cubic TiC and hexagonal Ti mixture of phases (sample A7) This observation is in agreement with [3] were is studied the effect of synthesis condition on the formation of the TiC phase on Si substrate by DC magnetron ion-plasma sputtering of combined graphite/ titanium target. The authors show that increase of temperature allows to synthesized films with stoichiometry that coincide with that of TiC.…”
Section: Tem Measurementssupporting
confidence: 83%
“…According to [16] in the case of graphite crystallites = Å. We mention the fact that according to [3] the decrease of graphite crystallite sizes as result of increase of the deposition temperature is correlated with increase of TiC crystallite size with increase of deposition temperature. We consider that the decrease of ratio I I D G from 1.450 in the case of sample A3 to 1.220 in the case of sample A4 is due to increase of crystallite sizes caused by −700 V bias potential applied on the sample A4.…”
Section: Raman Measurementsmentioning
confidence: 92%
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