Influence of substrate outgassing on the plasma properties during wood treatment in He dielectric barrier discharges at atmospheric pressure

Levasseur, Olivier; Gangwar, Reetesh Kumar; Profili, Jacopo; Naudé, Nicolas; Ghérardi, Nicolas; Stafford, L.

doi:10.1002/ppap.201600172

Cited by 15 publications

(18 citation statements)

References 39 publications

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“…This latter difference with the jet configuration can most likely be attributed to the presence of N2 and O2 due to open-air configuration; this aspect was already discussed by Levasseur et al in He-based discharges. [29] The same Ar-NH3 jet study also reported Ar metastable number densities in the range of 10 11 and 10 12 cm -3 , which is in agreement with the values obtained in this work and those expected for glow dielectric barrier discharges (10 11 cm -3 ). [14,28] Another study reported argon atom metastable densities of 4.10 13 cm -3 in an Ar-NH3 discharge powered with 1.2 W.cm -3 at 15 kHz, which is 100 times higher than the values obtained in this study using similar dissipated volume powers (1.5 W.cm -3 with the 35 kHz, 1 mm) [30].This increase likely comes from a difference in the discharge regime since the large current peak duration (25 µs) reported by this group indicates the behavior of a Townsend discharge, which is known to be characterized by much higher metastable number densities [14].…”

Section: Discussionsupporting

confidence: 90%

Characterization of argon dielectric barrier discharges applied to ethyl lactate plasma polymerization

Laurent¹,

Desjardins²,

Meichelboeck³

et al. 2017

J. Phys. D: Appl. Phys.

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The influence of the input voltage frequency (35 and 150 kHz), interelectrode gap (1 and 2 mm) and precursor concentration (250, 350, and 450 ppm) on the electron temperature (Te), number density of metastable Ar atoms (n(Ar m )), and discharge current density (proportional to the electron density ne) is studied in an argon-ethyl lactate dielectric barrier discharge (DBD). An argon-ammonia Penning mixture is also considered as reference. These results are correlated to the chemistry (XPS, IR) and topography (AFM) of the ethyl-lactate-based plasma polymer coatings. Low Te values from 0.3 to 0.5 eV were obtained for all discharges. This observation, in addition to resemblances with the Ar-NH3 mixture, suggested that the ionization kinetics of ethyl lactate-based discharges is driven by Penning reactions. Among the investigated parameters, the dissipated power obtained through changes of the excitation frequency had the largest impact on both the coatings properties and the discharge behavior.

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Section: Discussionsupporting

confidence: 90%

Characterization of argon dielectric barrier discharges applied to ethyl lactate plasma polymerization

Laurent¹,

Desjardins²,

Meichelboeck³

et al. 2017

J. Phys. D: Appl. Phys.

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“…Overall, in these conditions, Te and n(Arm) thus vary by compensating one another. A similar behavior was previously reported for helium DBDs [9,33] and argon-ammonia discharges [10,24]. Figure 5.…”

Section: Variation Of the Electron Temperature And The Argon Metastabsupporting

confidence: 86%

Influence of a square pulse voltage on argon-ethyl lactate discharges and their plasma-deposited coatings using time-resolved spectroscopy and surface characterization

et al. 2018

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By comparing time-resolved optical emission spectroscopy measurements and the predictions of a collisional-radiative model, the evolutions of electron temperature (Te) and number density of argon metastable atoms (n(Ar m)) were determined in argon-ethyl lactate dielectric barrier discharges. The influence of a square pulse power supply on Te, n(Ar m), and the discharge current is evaluated and correlated to the chemistry and the topography of the plasma-deposited coatings. Pulsed discharges were found to have shorter (100 ns) but stronger (1 A) current peaks and higher electron temperatures (0.7 eV) than when using a 35 kHz sinusoidal power supply (2 µs, 30 mA, 0.3 eV). The n(Ar m) values seemed rather stable around 10 11 cm-3 with a sinus power supply. On the contrary, with a pulse power supply with long time off (i.e. time without discharge) between each pulse, a progressive increase of n(Arm) from 10 11 cm-3 up to 10 12-10 13 cm-3 was observed. When the time off was reduced, these increases were measured in sync with the current peak. The chemical composition of the coatings was not significantly affected by using a pulse signal whereas the topography was strongly influenced and led to powder formations when reducing the time off.

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“…In addition, it is well established that the deposition rate of SiOCH coatings in He/HMDSO plasmas is larger than the deposition rate of SiO x coatings in He/HMDSO/O 2 plasmas. [ 60 ] Therefore, considering substrate outgassing phenomena, the thickness of plasma‐deposited coatings is expected to be larger near the entrance than near the exit, as observed in Figure 5c.…”

Section: Resultsmentioning

confidence: 99%

Analysis of transport phenomena during plasma deposition of hydrophobic coatings on porous cellulosic substrates in plane‐to‐plane dielectric barrier discharges at atmospheric pressure

Babaei

Profili

Asadollahi

et al. 2020

Plasma Processes & Polymers

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In this study, four-layer stacks of bleached, unrefined Kraft papers are exposed to a plane-to-plane dielectric barrier discharge at atmospheric pressure operated in a glow-like discharge regime and sustained in a mixture of hexamethyldisiloxane and helium gases. Scanning electron microscopy confirms that the plasma-deposited coating follows the roughness of the porous cellulosic substrate. Whereas fairly spatially homogeneous coatings are obtained on silicon, significant variations of the coatings' thickness, organic content, and water contact angle are observed along the gas flow lines on the Kraft paper. These effects are even more important in the presence of substrate outgassing. In addition, plasma-generated species sequentially penetrate down to the fourth layer of the cellulosic substrate, rendering surfaces hydrophobic with very low water absorption kinetics.

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Influence of substrate outgassing on the plasma properties during wood treatment in He dielectric barrier discharges at atmospheric pressure

Cited by 15 publications

References 39 publications

Characterization of argon dielectric barrier discharges applied to ethyl lactate plasma polymerization

Characterization of argon dielectric barrier discharges applied to ethyl lactate plasma polymerization

Influence of a square pulse voltage on argon-ethyl lactate discharges and their plasma-deposited coatings using time-resolved spectroscopy and surface characterization

Analysis of transport phenomena during plasma deposition of hydrophobic coatings on porous cellulosic substrates in plane‐to‐plane dielectric barrier discharges at atmospheric pressure

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