2012
DOI: 10.1016/j.apsusc.2011.12.048
|View full text |Cite
|
Sign up to set email alerts
|

Influence of substrate bias voltage on structure and properties of the CrAlN films deposited by unbalanced magnetron sputtering

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1
1

Citation Types

2
27
0

Year Published

2013
2013
2021
2021

Publication Types

Select...
8

Relationship

0
8

Authors

Journals

citations
Cited by 100 publications
(31 citation statements)
references
References 35 publications
2
27
0
Order By: Relevance
“…This occurred despite the same chemical composition and phase microstructure of the outer CrAlN layer. We are in agreement with Lv et al [13] and believe that the different electrochemical behavior of our multilayer may be associated with their different surface defect densities. …”
Section: Sem Investigationssupporting
confidence: 82%
See 1 more Smart Citation
“…This occurred despite the same chemical composition and phase microstructure of the outer CrAlN layer. We are in agreement with Lv et al [13] and believe that the different electrochemical behavior of our multilayer may be associated with their different surface defect densities. …”
Section: Sem Investigationssupporting
confidence: 82%
“…As a consequence, the corrosion resistance of the CrAlN coating may be diminished, as shown by Sanchéz et al [9]. To our knowledge, the exact Al concentration that must be incorporated into the Cr-N system to obtain optimal values of hardness and elastic modulus, simultaneously with high oxidation resistance has never been indicated in the literature [12,13].…”
mentioning
confidence: 92%
“…The wear rate increased consistently with the increase in temperature. (5) The corrosion resistance of the substrate which coated with WBN or W 2 N films was higher than the uncoated substrate. Further improvement in corrosion resistance was obtained with the incorporation of boron.…”
Section: Discussionmentioning
confidence: 98%
“…With the development of modern manufacturing, especially the appearance of dry and high speed machining, low friction coefficient, high hardness and low wear rate are demanded. Many works [3][4][5][6] have been made to further enhance their performance by adding third element into TMeN since S. Vepřek and Reiprich [7] found Ti-Si-N composite films could get ultra-hardness of 80-105 GPa and high toughness.…”
Section: Introductionmentioning
confidence: 99%
“…Normally, as the bias voltage is increased, more defects could be created resulting from the enhanced ion bombardment. It is well known that the defects in the sputtered film will prohibit the migration of grain boundaries and small grains will be formed [34], [35]:…”
mentioning
confidence: 99%