Influence of substrate bias voltage on the microstructure and residual stress of CrN films deposited by medium frequency magnetron sputtering

Kong, Qinghua; Li, Ji; Li, Hongxuan; Liu, Xiaohong; Wang, Yongjun; Chen, Jianmin; Zhou, Hang

doi:10.1016/j.mseb.2011.04.015

Cited by 69 publications

(21 citation statements)

References 32 publications

(32 reference statements)

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“…ZHAO et al reported that, with increasing bias voltage, the Al content in TiAlN coatings decreased, whereas the residual compressive stresses and hardness increased up to -100 V and decreased with higher bias voltages [14]. Similar results were also published by other authors [15,16]. In a previous work, we studied TiAlN coatings that were grown by a triode magnetron sputtering system by increasing the bias voltage.…”

Section: Introductionsupporting

confidence: 80%

Bias voltage influence on the mechanical and tribological properties of titaniumaluminum nitride coatings produced by triode magnetron sputtering

Narvaez

Restrepo

2015

Matéria (Rio J.)

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Ti x Al 1-x N coatings were grown using the triode magnetron sputtering technique with various bias voltages between -40 V and -150 V. As the bias voltage increased, an increase in the Al atomic percentage was observed, presenting a competition with Ti and producing structural changes. Moreover, the grain size and roughness were also strongly influenced by the bias voltage. It was observed that coatings with concentrations of approximately 25% Al and 75% Ti exhibited an optimum mixture of mechanical and tribological properties. The average coefficient of friction was low for the TiAlN coating that was grown at -40 V. Additionally, the critical load was obtained by measuring the adhesion using the scratch test.

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Section: Introductionsupporting

confidence: 80%

Bias voltage influence on the mechanical and tribological properties of titaniumaluminum nitride coatings produced by triode magnetron sputtering

Narvaez

Restrepo

2015

Matéria (Rio J.)

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“…The similar phenomenon can be observed in TiN, CrN films and etc. 14,15 . However, when the positive bias voltage is used, a loose structure with a large number of voids and cracks will form.…”

Section: Abstract: Thin Film Iron Nitride Magnetic Sputtering Softmentioning

confidence: 99%

Effects of Bias Voltage on Fen Films Prepared by Magnetron Sputtering

et al. 2015

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“…CrN 코팅막은 열적 안정성, 고경도, 내마모성 및 내식성과 같은 우수한 기계적 및 기능적 특성 때문 에 보호 코팅 및 확산 베리어 분야에서 주목 받아 왔다 [1][2][3][4] . 최근에는 위와 같은 기계적, 물리적 특성 뿐만 아니라 뛰어난 전기전도도 및 내식성으로 인 하여 PEMFC(Polymer Electrolyte Membrane Fuel Cell) 용 금속계 분리판 코팅재료로도 주목받고 있 다 5) .…”

Section: 서 론unclassified

A Comparative Study of CrN Coatings Deposited by DC and Inductively Coupled Plasma Magnetron Sputtering

Seo¹,

Chun²

2012

Journal of the Korean institute of surface engineering

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Nanocrystalline CrN coatings were fabricated by DC and ICP (inductively coupled plasma) assisted magnetron sputtering techniques. The effect of ICP power, ranging from 0 to 500 W, on coating microstructure, preferred orientation mechanical properties were systematically investigated with HR-XRD, SEM, AFM and nanoindentation. The results show that ICP power has an significant influence on coating microstructure and mechanical properties of CrN coatings. With the increasing of ICP power, coating microstructure evolves from the columnar structure of DC process to a highly dense one. Grain size of CrN coatings were decreased from 11.7 nm to 6.6 nm with increase of ICP power. The maximum nanohardness of 23.0 GPa was obtained for the coatings deposited at ICP power of 500 W. Preferred orientation in CrN coatings also vary with ICP power, exerting an effective influence on film nanohardness.

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Influence of substrate bias voltage on the microstructure and residual stress of CrN films deposited by medium frequency magnetron sputtering

Cited by 69 publications

References 32 publications

Bias voltage influence on the mechanical and tribological properties of titaniumaluminum nitride coatings produced by triode magnetron sputtering

Bias voltage influence on the mechanical and tribological properties of titaniumaluminum nitride coatings produced by triode magnetron sputtering

Effects of Bias Voltage on Fen Films Prepared by Magnetron Sputtering

A Comparative Study of CrN Coatings Deposited by DC and Inductively Coupled Plasma Magnetron Sputtering

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