Influence of substrate bias voltage on structure, mechanical and corrosion properties of ZrO2 thin films deposited by Reactive Magnetron Sputter Deposition
“…An intermediate film was required prior to the deposition of the Zr‐N films in order to improve the adhesion of the Zr‐N films to the substrates. [ 46 ] In these experiments, before the deposition of each film, a layer of zirconium with thickness of 100 nm was deposited under constants parameters (Target‐Substrate distance: 30 mm, working pressure: 2.66 Pa, power: 250 W; deposition time: 10 min, bias substrate: 0 V).…”
Zirconium nitride films are deposited onto stainless steel AISI 316L and silicon (100) by radio frequency magnetron sputtering at different nitrogen flow ratios [N2/(Ar+N2)] varied between 0 and 0.25). Scanning electron microscope, atomic force microscopy, X‐ray diffraction (XRD), and Raman are used to investigate the surface morphology and microstructure of the thin films. The mechanical and electrochemical properties of all coatings are evaluated and compared with the uncoated AISI 316L to explore the efficiency of surface modification. The XRD and Raman analysis show that all the films are crystalline. This shows that the increased nitrogen content leads to a transformation from hexagonal α‐Zr phase to cubic c‐Zr and then to mixed α‐Zr and face centered cubic c‐ZrN phases. The films deposited with nitrogen flow ratio of 0.2 show the highest hardness of 32.2 GPa. Using the potentiodynamic polarization method, the corrosion behavior of the films is studied in Hank's solution. The comparison between uncoated and coated substrates shows a decrease in corrosion current density for all coated samples.
“…An intermediate film was required prior to the deposition of the Zr‐N films in order to improve the adhesion of the Zr‐N films to the substrates. [ 46 ] In these experiments, before the deposition of each film, a layer of zirconium with thickness of 100 nm was deposited under constants parameters (Target‐Substrate distance: 30 mm, working pressure: 2.66 Pa, power: 250 W; deposition time: 10 min, bias substrate: 0 V).…”
Zirconium nitride films are deposited onto stainless steel AISI 316L and silicon (100) by radio frequency magnetron sputtering at different nitrogen flow ratios [N2/(Ar+N2)] varied between 0 and 0.25). Scanning electron microscope, atomic force microscopy, X‐ray diffraction (XRD), and Raman are used to investigate the surface morphology and microstructure of the thin films. The mechanical and electrochemical properties of all coatings are evaluated and compared with the uncoated AISI 316L to explore the efficiency of surface modification. The XRD and Raman analysis show that all the films are crystalline. This shows that the increased nitrogen content leads to a transformation from hexagonal α‐Zr phase to cubic c‐Zr and then to mixed α‐Zr and face centered cubic c‐ZrN phases. The films deposited with nitrogen flow ratio of 0.2 show the highest hardness of 32.2 GPa. Using the potentiodynamic polarization method, the corrosion behavior of the films is studied in Hank's solution. The comparison between uncoated and coated substrates shows a decrease in corrosion current density for all coated samples.
“…Otherwise, the material may undergo a plastic flow, and a reduction in hardness will occur if the energy of incident ions exceeds the critical level of energy. Besides hardness and elastic modulus, the ratio H 3 /E 2 is also important to evaluate the resistance of the coating to plastic deformation in loaded contact [73]. From the nanoindentation data, the plastic deformation resistance (H 3 /E 2 ) of Ti-Cr-N films was calculated and the values are presented in Table 3.…”
Ti-Cr-N coatings were deposited on Si (100) and AISI D2 tool steel substrates by reactive DC magnetron cosputtering technique from titanium and chromium target in mixed Ar/N 2 atmosphere. The Ar/N 2 ratio effects on the chemical composition, structure, morphology, intrinsic stress and mechanical properties of the Ti-Cr-N coatings were investigated. The growing process of Ti-Cr-N coatings can be divided into three stages: Stage I, in poisoning mode (low flow ratio 1 < Ar/N 2 ≤ 1.4), Stage II, in transition mode (intermediate flow ratio 1.4 ≤ Ar/N 2 ≤ 3) and Stage III in metallic mode (Ar/N 2 > 3). For all samples, XRD analysis shown the formation of mixed nitrides phases. In stage I, Ti 2 N, TiN 0.3 , and hexagonal-Cr 2 N phases were observed. In Stage II, TiN 0.3 , Cr 2 N, and cubic-TiN phases were formed, while only TiN and Cr 2 N are observed in stage III. The coatings deposited with Ar/N₂ ratio of 3 shows the largest hardness of 24 GPa which is attribute to the dense structure and smoother surface morphology. The properties of the films are discussed in terms of evolution growth stages resulting by the variation of Ar/N 2 flow ratios.
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