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2020
DOI: 10.1016/j.surfcoat.2020.125821
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Influence of substrate bias voltage on structure, mechanical and corrosion properties of ZrO2 thin films deposited by Reactive Magnetron Sputter Deposition

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Cited by 13 publications
(2 citation statements)
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“…An intermediate film was required prior to the deposition of the Zr‐N films in order to improve the adhesion of the Zr‐N films to the substrates. [ 46 ] In these experiments, before the deposition of each film, a layer of zirconium with thickness of 100 nm was deposited under constants parameters (Target‐Substrate distance: 30 mm, working pressure: 2.66 Pa, power: 250 W; deposition time: 10 min, bias substrate: 0 V).…”
Section: Methodsmentioning
confidence: 99%
“…An intermediate film was required prior to the deposition of the Zr‐N films in order to improve the adhesion of the Zr‐N films to the substrates. [ 46 ] In these experiments, before the deposition of each film, a layer of zirconium with thickness of 100 nm was deposited under constants parameters (Target‐Substrate distance: 30 mm, working pressure: 2.66 Pa, power: 250 W; deposition time: 10 min, bias substrate: 0 V).…”
Section: Methodsmentioning
confidence: 99%
“…Otherwise, the material may undergo a plastic flow, and a reduction in hardness will occur if the energy of incident ions exceeds the critical level of energy. Besides hardness and elastic modulus, the ratio H 3 /E 2 is also important to evaluate the resistance of the coating to plastic deformation in loaded contact [73]. From the nanoindentation data, the plastic deformation resistance (H 3 /E 2 ) of Ti-Cr-N films was calculated and the values are presented in Table 3.…”
Section: Mechanical Propertiesmentioning
confidence: 99%