Abstract:The application of a substrate bias during rf magnetron sputtering alters the crystalline structure, grain morphology, lattice strain and composition of Ba x Sr 1-x TiO 3 thin films. As a result, the dielectric properties of Pt/Ba x Sr 1-x TiO 3 /Pt parallel-plate capacitors change significantly. With increasing substrate bias we observe a clear shift of the ferroelectric to paraelectric phase transition towards higher temperature, an increase of the dielectric permittivity and tunability at room temperature, … Show more
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