2002
DOI: 10.1109/tmag.2002.802705
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Influence of stress and texture on soft magnetic properties of thin films

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Cited by 120 publications
(11 citation statements)
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“…For the dependence of H c , Zou has systematically explained how it is affected by sputtering gas pressure through the inner stress of the film. 13 Apparently, in the present case, a is even more sensitive to the stress than H c . The high tunability of a brings about more high-frequency application potentials of CoFeB thin films.…”
Section: Resultsmentioning
confidence: 49%
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“…For the dependence of H c , Zou has systematically explained how it is affected by sputtering gas pressure through the inner stress of the film. 13 Apparently, in the present case, a is even more sensitive to the stress than H c . The high tunability of a brings about more high-frequency application potentials of CoFeB thin films.…”
Section: Resultsmentioning
confidence: 49%
“…11 It has been successfully explained by Hoffmann, 12 and been developed by Zou. 13 Similar to FeCoSiN, the largest H k-sta is obtained at the lowest pressure, 0.75 mTorr, where the deterioration of soft magnetic properties (the largest H ce and H ch ) takes place, and it is suggested to be ascribed to the high compressive stress in the film because of the increased high-energy ions or atoms bombarding the substrate surfaces during sputtering. 14 With further increase of pressure from 1.5 mTorr up to 3 mTorr, H ce and H ch keep relatively constant, while H k-sta increases.…”
Section: Resultsmentioning
confidence: 93%
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“…A possible explanation for the observed reduction in coercivity in our irradiated samples, is therefore an overall smoother DW energy landscape after irradiation, which allows for domain formation and switching of the magnetization at lower magnetic fields. In addition to that, the release of internal stresses in the film, that has been reported during irradiation 48,49 , can also be responsible for improvements to the soft magnetic properties of our Permalloy 43 .…”
Section: Resultsmentioning
confidence: 77%
“…2 (a). As the magnetization curves at Φ = 0 • and Φ = 90 • are different, a weak uniaxial magnetic anisotropy K u , is present in the as-deposited Ni 81 Fe 19 and might be associated to internal stresses during the material growth or asymmetries in the deposition system 43 . The value of K u = 80(7) J m 3 has been obtained subtracting the area between the easy and hard axis loop of the as-deposited state.…”
Section: Resultsmentioning
confidence: 99%