Influence of reaction with XeF2 on surface adhesion of Al and Al2O3 surfaces

Zhang, Tianfu; Park, Jeong Young; Huang, Wenyu; Somorjai, Gábor A.

doi:10.1063/1.2992632

Cited by 16 publications

(21 citation statements)

References 18 publications

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“…SEM images of AFM tips revealed the tip radius of 30-40 nm. Because the contact AFM experiment was carried out at the low load (< 5 nN), the change of tip radius was ignorable, as confirmed with SEM images taken after the AFM experiment (20). SEM analysis is performed with a Variable Pressure Field Emission SEM Model S-4300SE/N (Hitachi).…”

Section: Methodsmentioning

confidence: 99%

Chemical effect of dry and wet cleaning of the Ru protective layer of the extreme ultraviolet lithography reflector

Belau

Park

Liang

et al. 2009

Journal of Vacuum Science &Amp; Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena

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We report the chemical influence of cleaning of the Ru capping layer on the extreme ultraviolet (EUV) reflector surface. The cleaning of EUV reflector to remove the contamination particles has two requirements; to prevent corrosion and etching of the reflector surface and to maintain the reflectivity functionality of the reflector after the corrosive cleaning processes. Two main approaches for EUV reflector cleaning: wet chemical treatments (sulfuric acid and hydrogen peroxide mixture (SPM), ozonated water, and ozonated hydrogen peroxide) and dry cleaning (oxygen plasma and UV/ozone treatment) were tested. The change of surface morphology and roughness were characterized using scanning electron microscopy (SEM) and atomic force microscopy (AFM), while the surface etching and change of oxidation states were probed with X-ray photoelectron spectroscopy (XPS). Significant surface oxidation of the Ru capping layer was observed after oxygen plasma and UV/ozone treatment, while the oxidation is unnoticeable after SPM treatment. Based on these surface studies, we found that SPM treatment exhibits the minimal corrosive interactions with Ru capping layer. We address 2 the molecular mechanism of corrosive gas and liquid-phase chemical interaction with the surface of Ru capping layer on the EUV reflector.* Corresponding author, e-mail address: somorjai@berkeley.edu Material names: Ruthenium, Ruthenium oxide, sulfuric acid, hydrogen peroxide, and ozonated water 3

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Section: Methodsmentioning

confidence: 99%

Chemical effect of dry and wet cleaning of the Ru protective layer of the extreme ultraviolet lithography reflector

Belau

Park

Liang

et al. 2009

Journal of Vacuum Science &Amp; Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena

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“…3(a) [23,32]. Multiple measurements were made, with a total of 10 consecutive approachewithdrawal cycles on each site.…”

Section: Resultsmentioning

confidence: 99%

“…Recently, for various materials (e.g., nanoparticles [20], nanowires [21], and tetrapods [22]), AFM FD spectroscopy was utilized to investigate the influence of surface modification on adhesion force. For example, Zhang et al demonstrated adhesion enhanced by AlF 3 , which is generated during the XeF 2 etching process [23]. Park et al reported that adhesion between atomically clean quasicrystals and an AFM tip is weakened by adsorption of adsorbate molecules [24].…”

Section: Introductionmentioning

confidence: 98%

Nanoscale adhesion between Pt nanoparticles and carbon support and its influence on the durability of fuel cells

Yuk

Joo

Cheon

et al. 2015

Current Applied Physics

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“…However, there is also a third peak that can be observed for as-deposited samples which is located at 77 eV. The literature is very scant on that matter, there is a record on Al-F bond located at 77 eV [37], however, no fluoride has been detected in our wide spectra, which is why this third peak more likely belongs to the Al-O bond affected by nitrogen as this is suggested by P.W. Wang et al [38].…”

Section: X-ray Photoelectron Spectroscopy (Xps) Datamentioning

confidence: 99%

Aluminum Nitride Nanofilms by Atomic Layer Deposition Using Alternative Precursors Hydrazinium Chloride and Triisobutylaluminum

et al. 2020

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The aim of this study is motivated by the pursuit to investigate the performance of new and as yet untested precursors such as hydrazinium chloride (N2H5Cl) and triisobutylaluminum Al(C4H9)3 in the AlN atomic layer deposition (ALD) process as well as to study effects of successive annealing on the quality of the resulting layer. Both precursors are significantly cheaper than their conventional counterparts while also being widely available and can boast easy handling. Furthermore, Al(C4H9)3 being a rather large molecule might promote steric hindrance and prevent formation of undesired hydrogen bonds. Chemical analysis is provided by X-ray photoelectron spectroscopy (XPS) and secondary-ion mass spectrometry (SIMS) techniques; surface morphology was studied using atomic force microscopy (AFM). Chlorine containing precursors such as AlCl3 are usually avoided in ALD process due to the risk of chamber contamination. However, experimental data of this study demonstrated that the use of N2H5Cl does not result in chlorine contamination due to the fact that temperature needed for HCl molecules to become reactive cannot be reached within the AlN ALD window (200–350 °C). No amount of chlorine was detected even by the most sensitive techniques such as SIMS, meaning it is fully removed out of the chamber during purge stages. A part of the obtained samples was subjected to annealing (1350 °C) to study effects of high-temperature processing in nitrogen atmosphere, the comparisons with unprocessed samples are provided.

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Influence of reaction with XeF2 on surface adhesion of Al and Al2O3 surfaces

Abstract: The change of surface adhesion after fluorination of Al and Al 2 O 3 surfaces using

Cited by 16 publications

References 18 publications

Chemical effect of dry and wet cleaning of the Ru protective layer of the extreme ultraviolet lithography reflector

Chemical effect of dry and wet cleaning of the Ru protective layer of the extreme ultraviolet lithography reflector

Nanoscale adhesion between Pt nanoparticles and carbon support and its influence on the durability of fuel cells

Aluminum Nitride Nanofilms by Atomic Layer Deposition Using Alternative Precursors Hydrazinium Chloride and Triisobutylaluminum

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