Influence of Power Pulse Parameters on the Microstructure and Properties of the AlCrN Coatings by a Modulated Pulsed Power Magnetron Sputtering

Zheng, Jun; Zhou, Hui; Gui, Binhua; Luo, Quanshun; Li, Haixu; Wang, Qimin

doi:10.3390/coatings7120216

Cited by 11 publications

(6 citation statements)

References 36 publications

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“…At higher ion source powers, the gas ionization rate increased; after a series of ion collisions and energy transfer, more ions with high energy were delivered into the growing coating surfaces, which promoted grain growth and nucleation in the coatings. Additionally, the thermal effect induced by the strong ion bombardment also promoted slight grain growth [27]. Figure 6a displays the XRD pattern of the AlTiVCuN/CrN coatings at various ion source powers.…”

Section: Microstructurementioning

confidence: 99%

Microstructure and Mechanical Properties of AlTiVCuN Coatings Prepared by Ion Source-Assisted Magnetron Sputtering

Mei,

Yan,

Wang

et al. 2023

Nanomaterials

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The AlTiVCuN coatings were deposited by magnetron sputtering with anode layer ion source (ALIS) assistance, and the microstructure and mechanical properties were significantly affected by the ion source power. With increasing the ion source power from 0 to 1.0 kW, the deposition rate decreased from 2.6 to 2.1 nm/min, and then gradually increased to 4.0 nm/min at 3.0 kW, and the surface roughness gradually decreased from 28.7 nm at 0 kW to 9.0 nm at 3.0 kW. Due to the enhanced ion bombardment effect, the microstructure of the coatings changed from a coarse into a dense columnar structure at 1.0 kW, and the grain size increased at higher ion source powers. All the coatings exhibited c-TiAlVN phase, and the preferred orientation changed from the (220) to the (111) plane at 3.0 kW. Due to the low Cu contents (1.0~3.1 at.%), the Cu atoms existed as an amorphous phase in the coatings. Due to the microstructure densification and high residual stress, the highest hardness of 32.4 GPa was achieved for the coating deposited at 1.0 kW.

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Section: Microstructurementioning

confidence: 99%

Microstructure and Mechanical Properties of AlTiVCuN Coatings Prepared by Ion Source-Assisted Magnetron Sputtering

Mei,

Yan,

Wang

et al. 2023

Nanomaterials

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“…As an important pulse parameter, the charge voltage also exhibited a significant effect on the microstructure evolution and mechanical properties. For example, Zheng et al [27] deposited the AlCrN coatings by MPPMS technique at various charge voltages, and found that higher charge voltage corresponded to a higher plasma density and stronger ionization, resulting in much denser microstructure, which increased the coating hardness.…”

Section: Introductionmentioning

confidence: 99%

Effect of Charge Voltage on the Microstructural, Mechanical, and Tribological Properties of Mo–Cu–V–N Nanocomposite Coatings

et al. 2021

Self Cite

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As an important high-power impulse magnetron sputtering (HIPIMS) parameter, charge voltage has a significant influence on the microstructure and properties of hard coatings. In this work, the Mo–Cu–V–N coatings were prepared at various charge voltages using HIPIMS technique to study their mechanical and tribological properties. The microstructure was analyzed by scanning electron microscope (SEM), X-ray diffraction (XRD), and transmission electron microscopy (TEM). The mechanical and tribological properties were investigated by nano-indentation and ball-on-disc tribometer. The results revealed that all the coatings showed a solid-solution phase of B1-MoVN, the V atoms dissolved into face-centered cubic (FCC) B1-MoN lattice by partial substitution of Mo, and formed a solid-solution phase. Even at a high Cu content (~8.8 at. %), the Cu atoms existed as an amorphous phase. When the charge voltage increased, more energy was put into discharge, and the microstructure changed from coarse structure into dense columnar structure, resulting in the highest hardness of 28.2 GPa at 700 V. An excellent wear performance with low friction coefficient of 0.32 and wear rate of 6.3 × 10−17 m3/N·m was achieved at 750 V, and the wear mechanism was dominated by mild abrasive and tribo-oxidation wear.

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“…Thickness dependence, which is mainly due to deposition time or power variations of the magnetic hysteresis observed in NiFeAg heterogeneous alloy films at ambient temperature onto glass substrates [ 39 ]. Higher charge voltage could expedite AlCrN coatings having a compact columnar microstructure by means of modulated pulsed power magnetron sputtering (MPPMS), with altered power pulse parameters [ 40 ]. In principle, if the particle size dispersal rests constant with thickness, the GMR in heterogeneous alloys would not be affected.…”

Section: Introductionmentioning

confidence: 99%

Effect of Target Composition and Sputtering Deposition Parameters on the Functional Properties of Nitrogenized Ag-Permalloy Flexible Thin Films Deposited on Polymer Substrates

2018

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We report the first results of functional properties of nitrogenized silver-permalloy thin films deposited on polyethylene terephthalic ester {PETE (C10H8O4)n} flexible substrates by magnetron sputtering. These new soft magnetic thin films have magnetization that is comparable to pure Ni81Fe19 permalloy films. Two target compositions (Ni76Fe19Ag5 and Ni72Fe18Ag10) were used to study the effect of compositional variation and sputtering parameters, including nitrogen flow rate on the phase evolution and surface properties. Aggregate flow rate and total pressure of Ar+N2 mixture was 60 sccm and 0.55 Pa, respectively. The distance between target and the substrate was kept at 100 mm, while using sputtering power from 100–130 W. Average film deposition rate was confirmed at around 2.05 nm/min for argon atmosphere and was reduced to 1.8 nm/min in reactive nitrogen atmosphere. X-ray diffraction, X-ray photoelectron spectroscopy, scanning electron microscopy, vibrating sample magnetometer, and contact angle measurements were used to characterize the functional properties. Nano sized character of films was confirmed by XRD and SEM. It is found that the grain size was reduced by the formation of nitride phase, which in turns enhanced the magnetization and lowers the coercivity. Magnetic field coupling efficiency limit was determined from 1.6–2 GHz frequency limit. The results of comparable magnetic performance, lowest magnetic loss, and highest surface free energy, confirming that 15 sccm nitrogen flow rate at 115 W is optimal for producing Ag-doped permalloy flexible thin films having excellent magnetic field coupling efficiency.

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Influence of Power Pulse Parameters on the Microstructure and Properties of the AlCrN Coatings by a Modulated Pulsed Power Magnetron Sputtering

Cited by 11 publications

References 36 publications

Microstructure and Mechanical Properties of AlTiVCuN Coatings Prepared by Ion Source-Assisted Magnetron Sputtering

Microstructure and Mechanical Properties of AlTiVCuN Coatings Prepared by Ion Source-Assisted Magnetron Sputtering

Effect of Charge Voltage on the Microstructural, Mechanical, and Tribological Properties of Mo–Cu–V–N Nanocomposite Coatings

Effect of Target Composition and Sputtering Deposition Parameters on the Functional Properties of Nitrogenized Ag-Permalloy Flexible Thin Films Deposited on Polymer Substrates

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