Influence of Oxygen Flow Rate on the Variation of Surface Roughness of Fused Silica during Plasma Polishing Process

Tian, Yuan; Liu, Weiguo; Hang, Lingxia

doi:10.1016/j.phpro.2011.06.067

Cited by 6 publications

(4 citation statements)

References 6 publications

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“…This is expected as increasing the amount of oxygen usually impedes the roughening effects of plasma. 34…”

Section: Resultsmentioning

confidence: 99%

“…This is expected as increasing the amount of oxygen usually impedes the roughening effects of plasma. 34 Second, the influence of pressure and plasma exposure duration on surface roughness was investigated. The 15 cc min −1 oxygen flow rate was chosen for this set of experiments because it resulted in greater roughness values compared to higher flow rates.…”

Section: Resultsmentioning

confidence: 99%

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Single-cell fluid-based force spectroscopy reveals near lipid size nano-topography effects on neural cell adhesion

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Lahoud,

Zantout

et al. 2024

Lab Chip

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“…This is expected as increasing the amount of oxygen usually impedes the roughening effects of plasma. 34…”

Section: Resultsmentioning

confidence: 99%

Section: Resultsmentioning

confidence: 99%

Single-cell fluid-based force spectroscopy reveals near lipid size nano-topography effects on neural cell adhesion

Habli,

Lahoud,

Zantout

et al. 2024

Lab Chip

View full text Add to dashboard Cite

show abstract

“…Such process gives opportunity to decrease of quartz sample roughness in two times (up to Ra=0,8 nm) and to create chemical clean surface without any defects. The results of quartz glass polishing by means of such gas as SF6, Ar or O2 RF plasma are represented in [6,7].…”

Section: Results Of the Polishing Vacuum Methods Researchmentioning

confidence: 99%

Vacuum methods of surface treatment with subnanometer roughness

Panfilov

Kolesnik

2018

MATEC Web Conf.

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Vacuum methods of surfaces with 1 nm or less roughness treatment were analyzed.Physical models of super sleek surfaces polishing into vacuum cambers by means of ion beam etching and thin film deposition and ion cluster treatment were shown.The results of experimental research of ion cluster polishing with differentregimes were represented.Prospects of surface treatment with subnanometer roughness by means of vacuum methods are represented.

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“…The plasma is produced by using a particular RF power source. 56 There are three gas sources in the system. The pumping system and gas-flow controllers are used in the system to keep the working pressure constant.…”

Section: Polishing Processes For Optical Componentsmentioning

confidence: 99%

Plasma polishing processes applied on optical materials: A review

Yadav

Kumar

et al. 2021

Journal of Micromanufacturing

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Nowadays, the surface quality of the material is crucial for industry and science. With the development of micro-electronics and optics, the demand for surface quality has become more and more rigorous, making optical surface polishing more and more critical. Plasma polishing technology is conceived as an essential tool for removing surface and subsurface damages from traditional polishing processes. The plasma processing technology is based on plasma chemical reactions and removes atomic-level materials. Plasma polishing can easily nano-finish hard-brittle materials such as ceramics, glass, crystal, fused silica, quartz, Safire, etc. The optical substrate with micro-level and nano-level surface roughness precision is in demand with the advancement in optics fabrication. The mechanical properties of super-finished optics materials are being used to fulfill the requirement of modern optics. This article discusses the processing of different types of freeform, complex and aspheric optical materials by the plasma polishing process used mainly by the optical industry. The plasma polishing devices developed in the last decade are thoroughly reviewed for their working principles, characteristics and applications. This article also examines the impact of various process parameters such as discharge power, rate of gas flow, mixed gas flow ratio and pressure on the plasma polishing process.

show abstract

Influence of Oxygen Flow Rate on the Variation of Surface Roughness of Fused Silica during Plasma Polishing Process

Cited by 6 publications

References 6 publications

Single-cell fluid-based force spectroscopy reveals near lipid size nano-topography effects on neural cell adhesion

Single-cell fluid-based force spectroscopy reveals near lipid size nano-topography effects on neural cell adhesion

Vacuum methods of surface treatment with subnanometer roughness

Plasma polishing processes applied on optical materials: A review

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