Influence of Nitrogen Admixture on Plasma Characteristics in a dc Argon Glow Discharge and in Afterglow

Dyatko, N. A.; Ionikh, Yu. Z.; Napartovich, Anatoly P.

doi:10.3390/atoms7010013

Cited by 16 publications

(4 citation statements)

References 41 publications

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“…Gas discharge plasma in Ar/N 2 mixtures is rather well understood [33][34][35]. However, which of the possible reactions and reaction pathways, including electron impact ionisation, dissociative ionisation, vibrational excitation, and vibrational pumping, to name only few, are dominant depends strongly on the total gas pressure, mixture and excitation mechanisms.…”

Section: Deposition Environmentmentioning

confidence: 99%

Microwave plasma-assisted reactive HiPIMS of InN films: Plasma environment and material characterisation

Hain

Schweizer

Sturm

et al. 2023

Surface and Coatings Technology

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Section: Deposition Environmentmentioning

confidence: 99%

Microwave plasma-assisted reactive HiPIMS of InN films: Plasma environment and material characterisation

Hain

Schweizer

Sturm

et al. 2023

Surface and Coatings Technology

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“…), gas laser manufacturing, and large-area flat-panel plasma screens. Besides, there are other essential applications in microelectronics industries [2]. Other important applications are the surface treatments of materials, which include surface etching for the manufacture of integrated circuits, plasma polymerization, polymer curing, and coating deposition [3].…”

Section: Introductionmentioning

confidence: 99%

Characterization and analysis of N2 plasma DC glow discharge at different voltage

Haji¹

2023

PEN

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In this work, the plasma glow discharge characteristics of nitrogen gas will be studied and analyzed at different pressures, and we will study the effect of these pressures on the I-V curve, the Panchen curve, the I-P curve, the current-voltage curve, and their effect on the electrical conductivity of the generated plasma. The distance between the glow electrodes was (15.5) cm. The pressures that were used in this work were (0.025, 0.05, 1.5, 5) T. The results indicated that the discharge was operating in the atypical glow region. On the other hand, the discharge current decreased as the gas pressure increased. On the other hand. Also, the conductivity decreased in its values with the increase in applied pressure as well as the voltage of the plasma focus.

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“…By contrast, some reactive gases, such as oxygen, nitrogen, or air can be mixed in small quantities into the background of noble gas for the production of chemically active species, such as O 3 , OH, H 2 O 2 , NO, and OH radicals at low temperatures with a reduction in the breakdown voltage [ 23 , 24 ]. In a plasma generated from a gas mixture, the excited noble gas can ionize the reactive gas by energy transfer (Penning ionization) via collision, resulting in a change in the discharge characteristics [ 25 ].…”

Section: Introductionmentioning

confidence: 99%

Effect of the Plasma Gas Type on the Surface Characteristics of 3Y-TZP Ceramic

Kang

Kim

et al. 2022

IJMS

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Plasma surface treatment can be an attractive strategy for modifying the chemically inert nature of zirconia to improve its clinical performance. This study aimed to clarify the effect of plasma gas compositions on the physicochemical surface modifications of 3 mol% yttria-stabilized zirconia (3Y-TZP). The cold, atmospheric plasma discharges were carried out by using four different plasma gases, which are He/O2, N2/Ar, N2, and Ar from an application distance of 10 mm for 60 s. Static contact angles were measured to define the surface free energy. Changes in elemental composition, surface crystallinity, and surface topography were assessed with X-ray photoelectron spectroscopy (XPS), X-ray diffraction (XRD), confocal laser scanning microscopy (CLSM), and scanning electron microscopy (SEM), respectively. A significant decrease in water contact angle was observed in all plasma groups with the lowest value of 69° in the N2/Ar group. CLSM and SEM investigations exhibited no morphological changes in all plasma groups. XPS revealed that a reduction in the surface C content along with an increase in O content was pronounced in the case of N2/Ar compared to others, which was responsible for high hydrophilicity of the surface. XRD showed that the changes in crystallite size and microstrain due to oxygen atom displacements were observed in the N2/Ar group. The N2/Ar plasma treatment may contribute to enhancing the bioactivity as well as the bonding performance of 3Y-TZP by controlling the plasma-generated nitrogen functionalities.

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Influence of Nitrogen Admixture on Plasma Characteristics in a dc Argon Glow Discharge and in Afterglow

Cited by 16 publications

References 41 publications

Microwave plasma-assisted reactive HiPIMS of InN films: Plasma environment and material characterisation

Microwave plasma-assisted reactive HiPIMS of InN films: Plasma environment and material characterisation

Characterization and analysis of N2 plasma DC glow discharge at different voltage

Effect of the Plasma Gas Type on the Surface Characteristics of 3Y-TZP Ceramic

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