Influence of Nickel Silicide Thin Film on Series Resistance of Silicon Solar Cells

Li, Tao; Wang, Wenjing; Zhou, Chen; Liu, Zhengang; Zhao, Lei; Li, Hailing; Diao, Hongwei

doi:10.2174/157341312801784249

Cited by 5 publications

(1 citation statement)

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“…Recently, light-induced electroplating of silver after screen-printing has received lots of attention for the less electrical losses due to the line resistance. [1][2][3][4][5][6][7][8][9] In addition, low silver consumption relatively to solar cell efficiency increase makes light-induced electroplating potential in photovoltaic industry. [10][11][12][13][14][15][16][17][18][19][20][21] In this paper, the focus is on the two-layer electrode of light-induced electroplating after screen-printing.…”

Section: Introductionmentioning

confidence: 99%

Improvement on electrical properties of screen-printed silicon solar cells by light-induced electroplating of silver

Tao¹,

Wang²

2016

Jpn. J. Appl. Phys.

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The total power losses are analyzed based on two-layer electrode of light-induced electroplating after screen printing. By the introduction of scale factor in the calculation, optical losses are closer to the actual condition. Optimized two-layer contact of front side could diminish power losses distinctly and improve the current–voltage (I–V) characteristic of crystalline silicon solar cells. The relative increments of I–V parameters as a function of electroplating time are measured. The quantitative comparison of analytical results between half-ellipse shape model and half-circled shape model is performed. The numerical simulation results and experimental data show good agreement. Due to the successful verification, the simulation results could be used to optimize the two-layer electrode structure and light-induced electroplating process.

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