Influence of multi-photon ionization of Xe on a XeF discharge induced by KrF laser irradiation

Takahashi, Eiichi; Katō, Susumu; Okuda, I.

doi:10.1007/s00340-009-3567-z

Cited by 1 publication

(1 citation statement)

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“…It has been reported that adding Xe (even at partial pressure of less than 0.1 Torr) into Ar/F 2 /Ne mixtures sharply increases the photo-charge signal in the experiment. Similar conclusions have been drawn in a study of XeF excimer lasers [57]. Besides, the reason why we choose this process is based on the work of Xiong and Kushner [35], it is believed that the conversion rate from Ne * to Ne * 2 is quite fast at high gas pressures.…”

Section: Helmholtz Photoionization Model For Arf Excimer Laserssupporting

confidence: 65%

Numerical investigation of discharge evolution and breakdown characteristics of ArF excimer lasers

Ma,

Bai,

Zhu

et al. 2024

Plasma Sources Sci. Technol.

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The corona bar induced pre-ionization is a crucial preliminary process in the operation of ArF excimer lasers, directly impacting the uniformity and stability of output laser. However, the ultraviolet corona pre-ionization, as the mainstream method, is tightly coupled with the main discharge process, which complicates analysis. Here, we establish a numerical model of a single pulse discharge incorporating an external circuit to analyze the pre-ionization process and its influence on the breakdown characteristics. (1) By adopting detailed input parameters of photoionization model, we observe uniform and dispersed plasma propagation from the corona bar to the main gap. (2) An artificial boundary condition is proposed to investigate the phenomenological effect of high-energy electrons emission, emphasizing the influence of surface discharge along the cathode. (3) The differences between the two pre-ionization setup methods, photoionization and background electron density, are compared numerically. This study enhances the understanding of the pre-ionization process in ArF excimer lasers and provides theoretical insights for their optimization and design.

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Section: Helmholtz Photoionization Model For Arf Excimer Laserssupporting

confidence: 65%