Influence of modulation period on structure and mechanical properties of WB2/CrN films deposited by direct-current magnetron sputtering

Resistive Switching Effects of Crystal‐Ion‐Slicing Fabricated LiNbO3 Single Crystalline Thin Film on Flexible Polyimide Substrate

“…Most oxide thin films fabricated by sputtering or pulsed laser deposition for resistive switching show polycrystalline or amorphous structure. [ 10,11 ] Therefore, the random distribution of grain and grain boundary in polycrystalline thin film results in the problems such as random electroforming process, low uniformity and stability. [ 12 ] Similar phenomenon has also been reported in the amorphous resistive switching thin films.…”

Structure, mechanical properties and oxidation resistance of iso and non-iso architected TiN/Cr multilayers coatings deposited by magnetron sputtering

“…Some other advantages can be acquired by mixing different periods in non-isostructured coatings: since different layer sizes may induce the formation of phases with distinct crystalline structures 2,[11][12][13] , materials properties can be varied along the coating thus resulting in more advanced elasto-plastic or diffusional effects. Advantageously, once the variation in films architecture by magnetron sputtering (MS) can be obtained only by redistributing layer sizes, no physical adjustment is necessary to produce such coatings.…”