Abstract:Raman spectroscopy is used to investigate the morphology of silicon phase composition in the indenter imprint with spatial resolution of ~200 nm. Suppression of the efficiency of Si-XII, Si-III, and a-Si phase formation induced by beta-particle irradiation from a 90 Sr + 90 Y source (fluence F = 3.6⋅10 10 cm -2 ) is revealed.
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