Influence of Increasing Density of Microstructures on the Self‐Propagating Reaction of Al/Ni Reactive Nanoscale Multilayers
Konrad Jaekel,
Sascha Sebastian Riegler,
Yesenia Haydee Sauni Camposano
et al.
Abstract:Surface structuring methods are crucial in semiconductor manufacturing, as they enable the creation of intricate structures on the semiconductor surface, influencing the material’s electrical, mechanical, and chemical properties. This study employs one such structuring method known as reactive ion etching to create black Si structures on silicon substrates. After thermal oxidation, their influence on the reaction of Al/Ni nanoscale multilayers is. For this purpose, various densities of thermally oxidized black… Show more
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