Influence of implantation of Au− ions on the microstructure and mechanical properties of the nanostructured multielement (TiZrHf VNbTa)N coating

Abstract

Abstract-It has been found that the phase with the fcc lattice of the NaCl structural type is formed due to the vacuum arc deposition of the nanostructured multicomponent (TiZrHfVNbTa)N coating. Implantation of negative Au -ions with a dose of 1 × 10 17 cm -2 leads to the formation of a disordered polycrystalline struc ture without a preferred orientation of the fcc phase and nanocrystallites from 5-7 to 1-3 nm is size, which are dispersed in a layer up to 35 nm in depth. Nanohardness increases to 33 GPa, and the Vickers hardness reaches 51 GPa. Gold nanoclusters are formed in the near surface region, while the fcc lattice and the for mation of local Au regions are observed in the coating itself. Fragments with the hcp lattice are formed at depths above 180 nm because of the low nitrogen concentration.

Nanostructured multielement (TiHfZrNbVTa)N coatings before and after implantation of N+ ions (1018cm−2): Their structure and mechanical properties

“…Most of HEA nitrides consist of 5, 6 or 7 elements, but they can incorporate up to 19 elements [38][39][40][41][42][43][44][45] resistance remains still largely unexplored. For the last few years several papers, devoted to the influence of Cu -, Au -, N + ion implantation on hardness, plasticity index and corrosion resistance were published [46][47][48][49][50]. Improvement of different characteristics, such as hardness, were found in the case of relatively high doses of implantation (1-2)Á10 17 cm À2 [46,49,[51][52][53].…”

“…Improvement of different characteristics, such as hardness, were found in the case of relatively high doses of implantation (1-2)Á10 17 cm À2 [46,49,[51][52][53]. Overview of published studies devoted to the characteristics and properties of HEA nitride coatings shows that improvement of physicalmechanical characteristics is usually obtained in a narrow ion dose range [54,46,55]. However, there are no studies devoted to implantation of high doses of N + ions (up to 10 18 cm À2 ), typically when the dose of implanted ions may reach the atomic concentration of the solid material of solid (1 Â 10 23 Ä 5 Â 10 23 cm À3 ).…”

“…For the last few years several papers, devoted to the influence of Cu -, Au -, N + ion implantation on hardness, plasticity index and corrosion resistance were published [46][47][48][49][50]. Improvement of different characteristics, such as hardness, were found in the case of relatively high doses of implantation (1-2)Á10 17 cm À2 [46,49,[51][52][53]. Overview of published studies devoted to the characteristics and properties of HEA nitride coatings shows that improvement of physicalmechanical characteristics is usually obtained in a narrow ion dose range [54,46,55].…”

Structure and Physicomechanical Properties of Nanostructured (TiHfZrNbVTa)N Coatings after Implantation of High Fluences of N+(1018cm-2)

“…Formation of nitrides and carbides from high-entropy alloys is also a current task of modern materials science, because such materials have much higher wear, corrosion and oxidation resistance, higher hardness and plasticity in comparison with clear highentropy alloys. The task of clarifying the limits of resistance of such nitride coatings to oxidation and irradiation resistance after Cu − , Au − , N + ion implantation, as well as influence of ion implantation on hardness, plasticity index and corrosion resistance of HEAN coatings were discussed in the papers [14,[20][21][22]. High fluences of implantation (1−2 × 10 17 cm −2 ) led to improving different mechanical characteristics, such as hardness [23,24].…”

Structure and physicomechanical properties of NbN-based protective nanocomposite coatings: A review

“…It is known that optimization and control of reactive ion sputtering are fairly complicated [36][37][38] because of the hysteresis effect that occurs upon the addition of a reactive gas that affects the coating stoichiometry directly during deposition. Nb-X-N coating is mostly deposited via chemical vapor deposition (CVD) [39,40] or physical vapor deposition (PVD) techniques [41][42][43][44][45][46][47][48][49][50][51][52].…”