2019
DOI: 10.1016/j.jlumin.2019.116631
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Influence of growth time and substrate type on the microstructure and luminescence properties of ZnO thin films deposited by RF sputtering

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Cited by 41 publications
(13 citation statements)
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“…Similar temperature effects were reported in the AFM study by Prasada Rao et al [21]. The RMS roughness obtained for the ZnO thin films deposited with ultrasonic spray pyrolysis at 450 • C from a pH 4 solution compares well with values usually measured for ZnO films obtained by more complex techniques such as ion-beam or RF magnetron sputtering [52,53].…”
Section: Tablesupporting
confidence: 87%
“…Similar temperature effects were reported in the AFM study by Prasada Rao et al [21]. The RMS roughness obtained for the ZnO thin films deposited with ultrasonic spray pyrolysis at 450 • C from a pH 4 solution compares well with values usually measured for ZnO films obtained by more complex techniques such as ion-beam or RF magnetron sputtering [52,53].…”
Section: Tablesupporting
confidence: 87%
“…However, the presence of the amorphous ZnO phase cannot be ruled out a priori. The patterns of the sputtered ZnO thin films grown at room temperature show the characteristic peaks of hexagonal wurtzite structure, with strong (002) reflection, which indicates preferential growth orientation perpendicular to the substrate [ 33 , 34 , 35 , 36 ].…”
Section: Resultsmentioning
confidence: 99%
“…The (002) peak position was 34.22° for as-deposited lms and it shifted to higher angles up to the 34.553° for the sample annealed at 450 °C. It is important to note that the 2θ value is 34.42° for stress-free bulk ZnO [35].…”
Section: Xrd Analysismentioning
confidence: 99%