2006
DOI: 10.1016/j.surfcoat.2005.03.044
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Influence of film structure and composition on diffusion barrier performance of SiOx thin films deposited by PECVD

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Cited by 77 publications
(69 citation statements)
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“…9 The columnar well-defined growth structure obtained by Grü niger et al when using a plasma-enhanced chemical vapor deposition (PECVD) radio frequency plasma apparatus and oxygen as a carrier gas cannot be seen. 10 Furthermore, the uniform phase image (Fig. 7) of plasma-deposited film shows that most likely the HMDSO film is continuous without clear phase separations, even though the topography of the coating shows a depth variation of up to 20 nm in a 5 lm 9 5 lm sample area.…”
Section: Afmmentioning
confidence: 95%
“…9 The columnar well-defined growth structure obtained by Grü niger et al when using a plasma-enhanced chemical vapor deposition (PECVD) radio frequency plasma apparatus and oxygen as a carrier gas cannot be seen. 10 Furthermore, the uniform phase image (Fig. 7) of plasma-deposited film shows that most likely the HMDSO film is continuous without clear phase separations, even though the topography of the coating shows a depth variation of up to 20 nm in a 5 lm 9 5 lm sample area.…”
Section: Afmmentioning
confidence: 95%
“…The wavelength dependence of the refractive index was approximated with a Cauchy model [10]. Reference thickness measurements were performed with a stylus profilometer (Tencor P10).…”
Section: Deposition Rates and Mass Densitymentioning
confidence: 99%
“…In particular the nano-sized amorphous SiO x coatings receive considerable attention in packaging industry due to their excellent diffusion barrier performance and high transparent rate. The main advantages of these coatings compared to metallic films are optical transparency, recyclability, and suitability for microwave heating [6] . Common deposition techniques for SiO x films are based on physical vapor deposition (PVD) or plasma-enhanced chemical vapor deposition (PECVD).…”
Section: Introductionmentioning
confidence: 99%