Using high-quality polycrystalline chemical-vapordeposited diamond films with large grains (∼ 100 µm), field effect transistors (FETs) with gate lengths of 0.1 µm were fabricated. From the RF characteristics, the maximum transition frequency f T and the maximum frequency of oscillation f max were ∼ 45 and ∼ 120 GHz, respectively. The f T and f max values are much higher than the highest values for singlecrystalline diamond FETs. The dc characteristics of the FET showed a drain-current density I DS of 550 mA/mm at gate-source voltage V GS of −3.5 V and a maximum transconductance g m of 143 mS/mm at drain voltage V DS of −8 V. These results indicate that the high-quality polycrystalline diamond film, whose maximum size is 4 in at present, is a most promising substrate for diamond electronic devices.Index Terms-Field effect transistor (FET), hydrogen terminated, polycrystalline diamond, RF performance.