2009
DOI: 10.1016/j.tsf.2008.10.021
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Influence of effective surface area on gas sensing properties of WO3 sputtered thin films

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Cited by 151 publications
(54 citation statements)
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“…Although pure WO 3 is a recognized candidate for gasochromic, electrochromic, and photochromic devices, its morphological characteristics are strongly dependent on the conditions and methods used in its fabrication, as revealed in the literature [1][2][3][4][5][6][7][8][9][10]. An improvement in its gasochromic detection sensitivity and in its increased temperature range of operation as a sensor, which for undoped thin films of WO 3 grown by radio-frequency (RF) magnetron sputtering are achieved at a deposition temperature of *200°C [9,10], as well as in its electrochromic and photocatalytic properties, has been achieved by doping with appropriate metals or by addition of metal/metal oxide additives [7][8][9][10][11][12][13][14][15][16][17][18].…”
Section: Introductionmentioning
confidence: 99%
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“…Although pure WO 3 is a recognized candidate for gasochromic, electrochromic, and photochromic devices, its morphological characteristics are strongly dependent on the conditions and methods used in its fabrication, as revealed in the literature [1][2][3][4][5][6][7][8][9][10]. An improvement in its gasochromic detection sensitivity and in its increased temperature range of operation as a sensor, which for undoped thin films of WO 3 grown by radio-frequency (RF) magnetron sputtering are achieved at a deposition temperature of *200°C [9,10], as well as in its electrochromic and photocatalytic properties, has been achieved by doping with appropriate metals or by addition of metal/metal oxide additives [7][8][9][10][11][12][13][14][15][16][17][18].…”
Section: Introductionmentioning
confidence: 99%
“…An improvement in its gasochromic detection sensitivity and in its increased temperature range of operation as a sensor, which for undoped thin films of WO 3 grown by radio-frequency (RF) magnetron sputtering are achieved at a deposition temperature of *200°C [9,10], as well as in its electrochromic and photocatalytic properties, has been achieved by doping with appropriate metals or by addition of metal/metal oxide additives [7][8][9][10][11][12][13][14][15][16][17][18]. Due to electron transfer from the metal oxide to the added metal on its surface, a decrease in the electron concentration in the metal oxide surface layer occurs.…”
Section: Introductionmentioning
confidence: 99%
“…We studied gas sensors made of sputteredˆlms of various oxide semiconductors, such as SnO 2 , 4-7) WO 3 , [8][9][10] and MoO 3 . 11) Bearing the Thornton diagram in mind, we depositedˆlms under various discharge gas pressures and substrate temperatures and attempted to qualitatively evaluate theˆlm porosity by measuring thê lm density.…”
Section: Introductionmentioning
confidence: 99%
“…This method was applied to WO 3 sputteredˆlms in our previous study, 9,10) in which, however, the measurement of surface area was performed mostly for annealedˆlms. The measurement was performed forˆlms deposited at a high pressure of 20 Pa and annealed at diŠerent temperatures 9) and forˆlms deposited at diŠerent pressures and annealed at 600°C.…”
Section: Introductionmentioning
confidence: 99%
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