Influence of Different CH4/N2 Ratios on Structural and Mechanical Properties of a-CNx:H Film Synthesized Using Plasma Focus

Umar, Zeshan Adeel; Ahmad, Riaz; Rawat, Rajdeep Singh; Hussnain, Ali; Khalid, Nida; Chen, Zhong; Shen, Lu; Zhang, Zheng; Hussain, Tousif

doi:10.1007/s10894-014-9723-4

Cited by 8 publications

(7 citation statements)

References 37 publications

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“…The analysis also shows a significant amount of oxygen at the surface of the synthesized thin films, which is attributed to the presence of copper impurity supported by the fact that only rotary vane pump is used for generating vacuum. In addition, the FESEM images show that the morphology consist of nanoparticles and nanoparticles clusters offering large surface to volume ratio resulting in oxidation of the thin films …”

Section: Resultsmentioning

confidence: 99%

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Structural, compositional and hardness properties of hydrogenated amorphous carbon nitride thin films synthesized by dense plasma focus device

Umar

Rawat

Ahmad

et al. 2016

Surface & Interface Analysis

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The hydrogenated amorphous carbon nitride (a-CN x :H) thin films were synthesized on the SS-304 substrates using a dense plasma focus device. The a-CN x :H thin films were synthesized using CH 4 /N 2 admixture gas and 20 focus deposition shots on substrates placed at different distances from the anode top. X-ray photoelectron spectroscopy and Raman analysis confirmed different C-N bonding in the a-CN x :H thin films. A decrease in the N/C ratio as well as the sp 3 /sp 2 ratio with an increase in the substrate distance has been observed. The higher amount of C-N formation for the film synthesized at 10 cm is observed which decreases with increasing distance. The X-ray photoelectron spectroscopy and Raman analysis affirmed the C ≡ N presence in all the thin films synthesized at different distances. The morphology of the synthesized a-CN x :H thin films showed nanoparticles and nanoparticle clusters formation at the surface. The hardness results showed comparatively lower hardness of the a-CN x :H thin films due to the presence of C ≡ N. The C-N formation with lower amount of C ≡ N and a higher N/C ratio as well as a higher sp 3 /sp 2 ratio for the films synthesized at 10 cm show reasonably higher hardness.

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Section: Resultsmentioning

confidence: 99%

“…These energetic ions and electron beams are utilized previously to mould thin films, ion implantation and surface modifications . We have previously reported the effects of different CH 4 /N 2 admixture gas ratio on the structural and mechanical properties of a‐CN x :H thin films …”

Section: Introductionmentioning

confidence: 99%

Structural, compositional and hardness properties of hydrogenated amorphous carbon nitride thin films synthesized by dense plasma focus device

Umar

Rawat

Ahmad

et al. 2016

Surface & Interface Analysis

Self Cite

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“…The energetic processing of the films deposited at higher (20 and 30) focus shots results in increased thickness of the film, which in turn increases intensity of AlN (111) plane. [21] A very weakly crystalline (110) phase of Al 3 CON appears for 20 and 30 focus deposition shots. The unexposed silicon reveals only (311) diffraction plane, whereas the samples exposed to multiple shots show the polycrystalline Si pattern.…”

Section: Xrd Analysismentioning

confidence: 98%

“…The films deposited with multiple shots show the presence of round shaped nano-sized particles at the surfaces which are indicative of the amorphous carbon present at the surface. [21,22] The films deposited with 20 and 30 focus shots show agglomeration of the nanoparticles at the surface. The agglomerates enlarge as the ion energies increase at higher focus shot and a flower-like texture appears.…”

Section: Surface Morphologymentioning

confidence: 99%

“…[13][14][15][16][17][18][19][20] Recently, we reported the synthesis of Al/a-C nanocomposite thin films on silicon and a-CN x :H films on SS-304 substrates kept at room temperature using DPF. [21,22] In this report the deposition of Al-C-N films on silicon substrates at room temperature is carried out by using the DPF device. The DPF is a prospective hybrid deposition technique which is being used to deposit composite thin films at room temperature.…”

Section: Introductionmentioning

confidence: 99%

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Structural and mechanical properties of Al–C–N films deposited at room temperature by plasma focus device

et al. 2016

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The Al-C-N films are deposited on Si substrates by using a dense plasma focus (DPF) device with aluminum fitted central electrode (anode) and by operating the device with CH 4 /N 2 gas admixture ratio of 1:1. XRD results verify the crystalline AlN (111) and Al 3 CON (110) phase formation of the films deposited using multiple shots. The elemental compositions as well as chemical states of the deposited Al-C-N films are studied using XPS analysis, which affirm Al-N, C-C, and C-N bonding. The FESEM analysis reveals that the deposited films are composed of nanoparticles and nanoparticle agglomerates. The size of the agglomerates increases at a higher number of focus deposition shots for multiple shot depositions. Nanoindentation results reveal the variation in mechanical properties (nanohardness and elastic modulus) of Al-C-N films deposited with multiple shots. The highest values of nanohardness and elastic modulus are found to be about 11 and 185 GPa, respectively, for the film deposited with 30 focus deposition shots. The mechanical properties of the films deposited using multiple shots are related to the Al content and C-N bonding.

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Asian African Association for Plasma Training (AAAPT)—History, Network, Activities, and Impact

Rawat

2017

Plasma Science and Technology for Emerging Economies

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Influence of Different CH4/N2 Ratios on Structural and Mechanical Properties of a-CNx:H Film Synthesized Using Plasma Focus

Cited by 8 publications

References 37 publications

Structural, compositional and hardness properties of hydrogenated amorphous carbon nitride thin films synthesized by dense plasma focus device

Structural, compositional and hardness properties of hydrogenated amorphous carbon nitride thin films synthesized by dense plasma focus device

Structural and mechanical properties of Al–C–N films deposited at room temperature by plasma focus device

Asian African Association for Plasma Training (AAAPT)—History, Network, Activities, and Impact

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