2008
DOI: 10.3788/aos20082805.1007
|View full text |Cite
|
Sign up to set email alerts
|

Influence of Deposition Temperature on Residual Stress of Yttria-Stabilized Zirconia Thin Films

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1

Citation Types

0
0
0

Year Published

2011
2011
2022
2022

Publication Types

Select...
1
1

Relationship

0
2

Authors

Journals

citations
Cited by 2 publications
(1 citation statement)
references
References 0 publications
0
0
0
Order By: Relevance
“…Magnetron Sputtering. As the glass substrate coated directly on the Ag, it could not achieve a good combination with glass [4], therefore TiO 2 thin films between the substrate glass and Ag film [5]. Its basic principle [6] was shown in Fig.…”
Section: Methodsmentioning
confidence: 99%
“…Magnetron Sputtering. As the glass substrate coated directly on the Ag, it could not achieve a good combination with glass [4], therefore TiO 2 thin films between the substrate glass and Ag film [5]. Its basic principle [6] was shown in Fig.…”
Section: Methodsmentioning
confidence: 99%