Influence of deposition parameters on the optical and structural properties of TiO2 films produced by reactive d.c. plasmatron sputtering

Schiller, S.; Beister, G.; Sieber, William K.; Schirmer, G.; Hacker, E.

doi:10.1016/0040-6090(81)90673-8

Cited by 99 publications

(31 citation statements)

References 4 publications

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“…In the visible region, where TiO 2 thin films are transparent, the light-scattering dominates over the absorption. In the visible range, the light-scattering losses increase with the increasing grain size, however, at wavelengths close to the absorption edge, the scattering losses are dominated by the fundamental absorption [10]. A good estimation of the optical gap E g can be derived from quadratic dependence of the absorbance vs. photon energy [7].…”

Section: Resultsmentioning

confidence: 99%

On the hydrophilicity of nitrogen-doped TiO2 thin films

et al. 2007

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Section: Resultsmentioning

confidence: 99%

On the hydrophilicity of nitrogen-doped TiO2 thin films

et al. 2007

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“…But, the rutile phase of TiO 2 is a desirable oxide phase for optical properties. Vacuumdeposited TiO 2 thin films with both anatase and rutile structure have been reported in the literature [5][6][7].…”

Section: Introductionmentioning

confidence: 98%

Cu/TiO2 thin films prepared by reactive RF magnetron sputtering

et al. 2015

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Cu/TiO 2 thin films were deposited on glass substrates by reactive RF magnetron sputtering technique. Crystalline structure, surface morphology and electronic structure were studied using X-ray diffraction (XRD), field emission scanning electron microscopy, atomic force microscopy and X-ray photoelectron spectroscopy (XPS). Transmittance and absorptance of these films were characterized by UV-Vis spectroscopy. XRD patterns demonstrate that TiO 2 films deposited on glass substrate at 300°C are observed to be in pure anatase phase, whereas Cu/TiO 2 films are amorphous in nature at 300°C substrate temperature. The crystallinity of Cu/TiO 2 thin films decreases with increasing the dopant concentrations of Cu in TiO 2 films. XPS studies show that Cu is in ?2 oxidation state in all films. The optical band gap of Cu/TiO 2 films decreases from *3.3 to *2.0 eV with the increase in the copper concentration. Further, antimicrobial studies of Cu/TiO 2 films with *3.9 at.% Cu exhibit high transmittance and best antimicrobial activity against E. coli and S. aureus compared to other doped films.

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“…Many different techniques can be used to deposit TiO 2 such as sol-gel process [8][9][10], chemical vapour deposition [11][12][13][14][15], ion beam depositions [16], and magnetron sputtering [17][18][19][20][21]. In this project the latter technique has been used to produce titania coatings, which were post-deposition annealed over a range of temperatures to allow their subsequent structural development to be investigated.…”

Section: Introductionmentioning

confidence: 99%

Characterisation Studies of the Structure and Properties of As-Deposited and Annealed Pulsed Magnetron Sputtered Titania Coatings

et al. 2013

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Titanium dioxide thin films are durable, chemically stable, have a high refractive index and good electro/photochemical proprieties. Consequently, they are widely used as anti-reflective layers in optical devices and large area glazing products, dielectric layers in microelectronic devices and photo catalytic layers in self-cleaning surfaces. Titania coatings may have amorphous or crystalline structures, where three crystalline phases of TiO 2 can be obtained: anatase, rutile and brookite, although the latter is rarely found. It is known, however, that the structure of TiO 2 coatings is sensitive to deposition conditions and can also be modified by post-deposition heat treatments. In this study, titania coatings have been deposited onto soda-lime glass substrates by reactive sputtering from a metallic target. The magnetron was driven in mid-frequency pulsed DC mode. The as-deposited coatings were analysed by micro Raman spectroscopy, X-ray diffraction (XRD), atomic force microscopy (AFM) and scanning electron microscopy (SEM). Selected coatings were annealed at temperatures in the OPEN ACCESSCoatings 2013, 3 167 range 200-700 °C and re-analysed. Whilst there was weak evidence of a nanocrystallinity in the as-deposited films, it was observed that these largely amorphous low temperature structures converted into strongly crystalline structures at annealing temperatures above 400 °C.

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Influence of deposition parameters on the optical and structural properties of TiO2 films produced by reactive d.c. plasmatron sputtering

Cited by 99 publications

References 4 publications

On the hydrophilicity of nitrogen-doped TiO2 thin films

On the hydrophilicity of nitrogen-doped TiO2 thin films

Cu/TiO2 thin films prepared by reactive RF magnetron sputtering

Characterisation Studies of the Structure and Properties of As-Deposited and Annealed Pulsed Magnetron Sputtered Titania Coatings

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