Influence of deposition conditions and of substrate on the structure of uhv deposited erbium films

Savaloni, Hadi; Player, M.A.

doi:10.1016/0042-207x(94)e0033-u

Cited by 55 publications

(38 citation statements)

References 7 publications

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“…At low deposition rate, films grow in a columnar form, while at increased deposition rates a fibrous structure is obtained, which mainly consists of buried adatoms. This observation is also in agreement with the experimental results of Savaloni and Player [13] for erbium films (see, for example, Fig. 2 in Ref.…”

Section: Resultssupporting

confidence: 92%

“…2 in Ref. [13]), though the experimental results are obtained for Er/Mo and shows a thickness dependence, particularly at s T = 575 K. The results of simulated films for different deposition rates (0.001 to 100 ML s -1 ) but at a lower substrate temperature of 400 K only showed a growth structure similar to Fig. 4c or Fig.…”

Section: Resultssupporting

confidence: 50%

“…Their basic premise is that evolution of structure is continuous and is the result of a life-death competition for growth between structural units. Savaloni et al [12][13][14][15] have also carried out an extensive investigation on the influence of deposition parameters, such as residual gas, film thickness, substrate temperature, substrate material and roughness, and deposition rate on Er, Cu and Zn films grown on different substrates. Kaiser [16], Petrov et al [17] and Barna and Adamik [18] reviewed the fundamentals of thin-film growth.…”

Section: Introductionmentioning

confidence: 98%

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Thin‐film‐growth characteristics by computer simulation: Nanostructural changes as a function of deposition conditions

Shahraki

Savaloni

2007

Physica Status Solidi (b)

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A 1 + 1 dimensional computer simulation model for thin-film deposition based on the ballistic aggregation of hard disks is developed, using the classical Monte Carlo method. The growth of thin metallic (e.g., Ni) and alloy (e.g., Co -Cr) films under different deposition conditions, considering the variation of different parameters, namely, substrate temperature, angle of incidence, substrate surface roughness (including amorphous substrates), and deposition rate, on a (111) face of fcc or a (100) face of hcp substrates is simulated. Results are qualitatively in good agreement with the structure zone model (SZM) predictions.

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Section: Resultssupporting

confidence: 92%

Section: Resultssupporting

confidence: 50%

Section: Introductionmentioning

confidence: 98%

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Thin‐film‐growth characteristics by computer simulation: Nanostructural changes as a function of deposition conditions

Shahraki

Savaloni

2007

Physica Status Solidi (b)

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“…It is clear from these images that the Er(D,T) 2−x 3 He x films exhibit columnar grains. Savaloni and Player performed a detailed study of the growth of 600 nm thick erbium metal films on molybdenum [20]. They used the zone model developed by Grovenor et.…”

Section: Resultsmentioning

confidence: 99%

Helium release and microstructural changes in Er(D,T)2−x3Hex films

Snow

Brewer

Gelles

et al. 2008

Journal of Nuclear Materials

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Er(D,T) 2−x3 He x , erbium di-tritide, films of thicknesses 500 nm, 400 nm, 300 nm, 200 nm, and 100 nm were grown and analyzed by Transmission Electron Microscopy, X-Ray Diffraction, and Ion Beam Analysis to determine variations in film microstructure as a function of film thickness and age, due to the time-dependent build-up of 3 He in the film from the radioactive decay of tritium. Several interesting features were observed: One, the amount of helium released as a function of film thickness is relatively constant. This suggests that the helium is being released only from the near surface region and that the helium is not diffusing to the surface from the bulk of the film. Two, lenticular helium bubbles are observed as a result of the radioactive decay of tritium into 3 He. These bubbles grow along the [111] crystallographic direction. Three, a helium bubble free zone, or "denuded zone" is observed near the surface. The size of this region is independent of film thickness. Four, an analysis of secondary diffraction spots in the Transmission Electron Microscopy study indicate that small erbium oxide precipitates, 5-10 nm in size, exist throughout the film. Further, all of the films had large erbium oxide inclusions, in many cases these inclusions span the depth of the film.3

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“…The low adatom mobility on Mn surfaces during low-temperature deposition causes cauliflower-like structure of about 10 nm in size [20]. Savaloni et al reported that increasing thin film thickness increases grain size and consequently the crystal structure and morphology change [21,22]. Figure 2 shows AFM images of the two-and three-dimensional configuration of samples with different morphologies.…”

Section: Results and Discussion Fesem And Afm Analysesmentioning

confidence: 99%

Design and fabrication of highly hydrophobic Mn nano-sculptured thin films and evaluation of surface properties on hydrophobicity

2017

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The wettability of solid surfaces is important from the aspects of both science and technology. The Mn nano-sculptured thin films were designed and fabricated by oblique angle deposition of Mn on glass substrates at room temperature. The obtained structure was characterized by field emission scanning electron microscopy and atomic force microscopy. The wettability of thin films samples was investigated by water contact angle (WCA). The 4-pointed helical star-shaped structure exhibits hydrophobicity with static WCAs of more than 133°for a 10-mg distilled water droplet. This sample also shows the rose petal effect with the additional property of high adhesion. The Mn nano-sculptured thin films also act as a sticky surface which is confirmed by hysteresis of the contact angle obtained from advancing and receding contact angles measurements. Physicochemical property of liquid phase could effectively change the contact angle, and polar solvents in contact with hydrophobic solid surfaces do not necessarily show high contact angle value.

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Influence of deposition conditions and of substrate on the structure of uhv deposited erbium films

Cited by 55 publications

References 7 publications

Thin‐film‐growth characteristics by computer simulation: Nanostructural changes as a function of deposition conditions

Thin‐film‐growth characteristics by computer simulation: Nanostructural changes as a function of deposition conditions

Helium release and microstructural changes in Er(D,T)2−x3Hex films

Design and fabrication of highly hydrophobic Mn nano-sculptured thin films and evaluation of surface properties on hydrophobicity

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