2000
DOI: 10.1006/spmi.2000.0956
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Influence of defects on elastic gate tunneling currents through ultrathin SiO2gate oxides: predictions from microscopic models

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Cited by 11 publications
(4 citation statements)
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“…Tunneling through defect states in a space-charge layer of the junction in the device is therefore considered as the dominant transport mechanism. The latter process can be performed as defect-assisted multiphonon tunneling [3][4][5][6][7][8][9][10] or as resonant tunneling through defects. 5,[11][12][13] For instance, for programmable oxide-nitrideoxide read only memories it has been shown that band-toband tunneling is negligible, while tunneling via defects dominates the charge leakage across the oxide-nitride-oxide sandwich structure.…”
Section: Introductionmentioning
confidence: 99%
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“…Tunneling through defect states in a space-charge layer of the junction in the device is therefore considered as the dominant transport mechanism. The latter process can be performed as defect-assisted multiphonon tunneling [3][4][5][6][7][8][9][10] or as resonant tunneling through defects. 5,[11][12][13] For instance, for programmable oxide-nitrideoxide read only memories it has been shown that band-toband tunneling is negligible, while tunneling via defects dominates the charge leakage across the oxide-nitride-oxide sandwich structure.…”
Section: Introductionmentioning
confidence: 99%
“…4 It was also found that resonant tunneling through oxide defects can essentially enhance the gate leakage currents through thin SiO 2 gates in metal-oxide semiconductor field-effect transistors with an oxide thickness smaller than 15 Å at area defect densities larger than 10 11 cm −2 . [6][7][8] According to Refs. 9 and 10 a significant increase in current in a p-n diode is evident at zerobias depletion layer widths of less than about 300 Å or, equivalently, above a dopant concentration of several 10 18 cm −3 .…”
Section: Introductionmentioning
confidence: 99%
“…The tunneling current can be conditioned by several possible tunneling mechanisms, [3][4][5][6][7][8][9][10][11][12][13] namely, ͑i͒ direct band-toband tunneling, ͑ii͒ phonon-assisted tunneling through defects, and ͑iii͒ resonant tunneling through defects. For different applied voltages different tunneling mechanisms can be dominant.…”
mentioning
confidence: 99%
“…In our previous experimental studies on n-GaAs/p-GaAs TDs [3,4] very high current densities of 20-25 A cm −2 were achieved at low applied voltages (∼0.1 V). According to our theoretical calculations [3,4], neither the direct tunnelling of electrons from the conduction band of the n-type part of TDs into the valence band of the p-type part nor the defect-assisted multiphonon tunnelling [5][6][7] can provide a satisfactory explanation for the experimental data. Instead, the resonant tunnelling [8][9][10] through defects homogeneously distributed within the depletion layer of the tunnel junction is the dominant transport mechanism responsible for the high currents at low applied voltages.…”
Section: Introductionmentioning
confidence: 72%