Influence of defects and displacements in sapphire doped with Ag+ ions

Chen, Huajian; Wang, Yuhua; Zhang, Xiaojian; Zheng, Lirong

doi:10.1016/j.apsusc.2015.09.166

Cited by 2 publications

(1 citation statement)

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“…Therefore, ion implantation stands out as a highly suitable and advanced technique for synthesizing metallic NPs within solid host matrices. With its precise control and compatibility with diverse materials, it offers unparalleled potential for NPs synthesis [17]. The process of ion implantation has a certain degree of flexibility and designability.…”

Section: Introductionmentioning

confidence: 99%

Investigation of the Optical Nonlinearity for Au Plasmonic Nanoparticles Based on Ion Implantation

Chu,

Wang,

Huang

et al. 2023

Nanomaterials

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The Au ion implantation process has emerged as an effective and simple method to be utilized for the fabrication of opto-electronic materials and devices due to numerous fascinating features of Au nanoparticles such as surface plasmon resonance (SPR), large third-order nonlinearity and a fast response time. In this paper, we describe the fabrication of a novel Au nanoparticle saturable absorber (Au NP-SA) by embedding the Au NPs into a SiO2 thin film using the ion implantation process, which shows excellent saturable absorption features due to the localized surface plasmon resonance (LSPR) effect of Au NPs. A stable and high-quality pulsed laser with a repetition rate of 33.3 kHz and a single pulse energy of 11.7 nJ was successfully constructed with the Au NP-SA. Both the stable operation characteristic of the obtained Q-switched pulsed laser and the high repeatability of the fabrication process of the Au NP-SA were demonstrated. In addition, the simple feasibility and maturity of the ion implantation process allow for the plasmonic nanoparticles to be easily integrated into other types of opto-electronic materials and devices to further improve their performance, and shows immense potential for the production of wafer-level products.

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Section: Introductionmentioning

confidence: 99%