Influence of counter-ions on the self-assembly of ZrO2 nanodisks

Self-assembly of disk-like multiring ZnO–SnO2 colloidal nanoparticles

“…This is similar to the self-assembly of target-like multiring ZrO 2 nanodisks [19][20][21]. It should be mentioned that the employed DBSA template solution with a concentration of 22 Â 10 À3 M is above the critical micellar concentration (CMC) of DBSA (typically 8.4 Â 10 À3 M) [25].…”

“…Note that there are no obvious diffraction peaks observed in the range 10-80°by the wide angle X-ray diffraction (WAXRD) scanning, indicating that this product is amorphous. According to literature [19][20][21][22][23][24], the strongest SAX-RD peak located at low diffraction angles (2-10°) means that high-ordered lamellar or mesoporous structures have been organized in analogous surfactant-templated inorganic-organic hybrid materials. Furthermore, the recorded d value coincides well with the lamellar spacing or mesoporous diameter.…”

“…Since we first assembled target-like multiring nanodisks of zirconia-surfactant colloidal films [19][20][21], great efforts have been made to synthesize analogous nanostructures for other single metal oxide colloidal films and particles but unfortunately, only lamellar [22] and mesoporous structures [23] are obtained. Then, we focus on the self-assembly of binary metallic oxide-surfactant composites [24].…”

Self-assembly and photocatalytic property of amorphous cubic-like TiO2-ZnO hybrid film

“…The wide-angle XRD pattern of TiO 2 -ZnO film has no obvious diffraction peaks appeared between 10º to 80º, suggesting this film is amorphous. According to literature [12][13][14][15][16][17], the recorded d value corresponding to the strongest XRD peak located at 2θ < 10° means the spacing between high-ordered lamellar nanostructures or the diameter of well-ordered mesoporous nanostructures in analogous surfactant-templated inorganicorganic films. In this work, the low-angle XRD pattern has a diffraction peak appeared at 2θ angle of 4.67º, corresponding to a d value of 1.89 nm.…”

“…An effective preparation method, namely self-assembly technology [9] has been widely applied to direct synthesis of well-ordered structural metallic oxide films. White et al [10,11] and our group [12][13][14][15][16][17] have successfully prepared a number of high-ordered SiO 2 , TiO 2 , ZrO 2 , SnO 2 , TiO 2 -ZrO 2 and ZrO 2 -SnO 2 films by a facial self-assembly method, using surfactants as structure-directing agents and organometallics as precursor under mild chemical reaction conditions. Accordingly, we are inspired to prepare well-ordered TiO 2 -ZnO film by the similar self-assembly method.…”