2016
DOI: 10.1016/j.jnoncrysol.2016.02.004
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Influence of corona discharge on holographic recording of diffraction gratings in Cu–chalcogenide film structures

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Cited by 4 publications
(5 citation statements)
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“…Thicknesses of As 2 Se 3 layers were d = 0.27 μm and d = 0.11 μm. Such layer thicknesses of As 2 Se 3 were also used in [3].…”
Section: Methodsmentioning
confidence: 99%
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“…Thicknesses of As 2 Se 3 layers were d = 0.27 μm and d = 0.11 μm. Such layer thicknesses of As 2 Se 3 were also used in [3].…”
Section: Methodsmentioning
confidence: 99%
“…The main disadvantage of such registration media is a relatively low photosensitivity about ~ 10-10 2 сm 2 /J [1]. In [2,3] the authors have tried to rise photosensitivity of the metal-ChG structures by applying of corona charge to ChG thin layers during their light exposure. It was established [3], that application of negative corona discharge during recording of optical holographic diffraction gratings in Cu-As 2 Se 3 thin film structures , in comparison of positive corona discharge, increases the holographic sensibility, the diffraction efficiency and the depth of the chemical etched relief.…”
Section: Introductionmentioning
confidence: 99%
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“…Laser-induced backside etching using a nanosecond-pulsed laser scan has also been reported for inscribing the grating on the silica glass [7]. Moreover, Nastas et al reported a holographic recording technique for chalcogenide glass using laser irradiation in conjunction with a corona discharge [8,9].…”
Section: Introductionmentioning
confidence: 99%
“…Это, прежде всего, фототермопластическая запись, запись за счет фотодиффузии металла (ФДМ) в освещенные участки пленки ХСП и запись за счет фотоструктурных превращений в пленке ХСП. Металлическая пленка служит адгезионным слоем, источником металла при ФДМ и является электродом при записи в поле коронного разряда [3][4][5][6][7].…”
Section: Introductionunclassified