2020 IEEE International Symposium on Smart Electronic Systems (iSES) (Formerly iNiS) 2020
DOI: 10.1109/ises50453.2020.00014
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Influence of conducting filament dimension on the performance of ReRAM device in the SET state

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Cited by 3 publications
(5 citation statements)
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“…Each ReRAM cell has a layered metal-insulator-metal structure, and stores information according to the resistance of the insulator part. According to the hopping percolation model, which is usually used to explain ReRAM conduction [27][28][29][30], electrons conduct in the form of moving from one hopping site to another in an insulator layer. Hopping sites are due to Oxygen vacancies (VO).…”
Section: Principlementioning
confidence: 99%
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“…Each ReRAM cell has a layered metal-insulator-metal structure, and stores information according to the resistance of the insulator part. According to the hopping percolation model, which is usually used to explain ReRAM conduction [27][28][29][30], electrons conduct in the form of moving from one hopping site to another in an insulator layer. Hopping sites are due to Oxygen vacancies (VO).…”
Section: Principlementioning
confidence: 99%
“…As the number of Endurance cycles increases, the size of the conductive filament (CF) expands [8,27]. In the case of HRS, the fluctuation rate decreases because the expansion of CF results in an increased number of hopping sites not involved in conduction (Fig.…”
Section: Preprocessingmentioning
confidence: 99%
“…The solution of eq is given in eq and produces a parabolic temperature profile T ( z ) with the maximum temperature ( T max ) in the middle of the filament (at z = 0), which is calculated from the finite element method (FEM) simulation. Here, the COMSOL simulator estimates the local temperature and temperature distribution across the device by solving heat and electrostatic equations. , Figure (a) and (b) depict the temperature and electric field profile. Figure (c) indicates the local temperature distribution across the TE–oxide layer–BE direction inside the MIM stack.…”
Section: Device Modelmentioning
confidence: 99%
“…Here, the COMSOL simulator estimates the local temperature and temperature distribution across the device by solving heat and electrostatic equations. 20,51 is measured with V a = 0.6 V and r f = 5 nm. The obtained T max , above the critical temperature T Crit = 600 K for the HfO 2 RRAM device, is adequate to contribute to resistive switching.…”
Section: ■ Device Modelmentioning
confidence: 99%
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