2004
DOI: 10.1016/j.polymer.2003.12.010
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Influence of block lengths and symmetries of block copolymers on phase behavior of polymer A/polymer B/block copolymer ternary blends

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Cited by 10 publications
(6 citation statements)
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References 22 publications
(11 reference statements)
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“…Two theories could be proposed to explain this observation: hydrogen bonds between pHEMA chains may have inhibited phase separation or very short PDMS blocks (1400 g mol À1 ) bridged between long end pHEMA blocks, slowing the phase separation. 37 The morphology of H92S8 could be explained in similar fashions based on the SAXS profile. In this copolymer, the ordered structure was disrupted due to asymmetry between the pHEMA and PDMS blocks, which led to a high intensity primary reflection and a weak and broad shoulder at higher q.…”
Section: Afm Analysismentioning
confidence: 85%
“…Two theories could be proposed to explain this observation: hydrogen bonds between pHEMA chains may have inhibited phase separation or very short PDMS blocks (1400 g mol À1 ) bridged between long end pHEMA blocks, slowing the phase separation. 37 The morphology of H92S8 could be explained in similar fashions based on the SAXS profile. In this copolymer, the ordered structure was disrupted due to asymmetry between the pHEMA and PDMS blocks, which led to a high intensity primary reflection and a weak and broad shoulder at higher q.…”
Section: Afm Analysismentioning
confidence: 85%
“…A number of researchers have considered the effect of copolymers on the demixing transition for different copolymer architectures. 256,302,303 Dadmun and Waldow 256 have pointed out that copolymers not only shift the transition point towards higher values of the Flory-Huggins parameter χ, but also change the critical exponents via a Fisherrenormalization mechanism. In the phase-segregated regime, copolymers aggregate to the interface, reduce the interfacial tension, and enlarge the interfacial width.…”
Section: Copolymers As Compatibilizersmentioning
confidence: 99%
“…Recently, devices created from nanopatterning, have usually been prepared within lithographically-defined templates, and have been paid great attention because of high effiency and low-cost. Up to now, several methods, such as phase separation 5 , laser deposition 1 , spin-coating 3 , atomic force microscopy (AFM) oxidation or selective wet etching 2 have been used to design micro-/nano-patternings of polymers or semiconductors. But the fussy processes and requirement of special equipment make them unsuitable for wide applications.…”
Section: Introductionmentioning
confidence: 99%