Influence of bipolar pulsed DC magnetron sputtering on elemental composition and micro-structure of Ti–Al–Y–N thin films

Möser, Martin; Mayrhofer, P.H.; Székely, László Á.; Sáfrán, György; Barna, P.B.

doi:10.1016/j.surfcoat.2008.08.042

Cited by 26 publications

(28 citation statements)

References 55 publications

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“…Shetty and Karimi [5] illustrated the crossover between the first developed c-TiN〈001〉 and the next c-TiN〈111〉 textures in thick (4.5 μm) single phase TiAlN film, deposited at high (possibly 650°C) substrate temperature. A crossover-like change in the orientation of c-TiN phase has been demonstrated in the 1.5-2 μm thick (Ti 1 − x Al x ) 1 − y Y y N films prepared at 500°C substrate temperature at oblique vapour beam incidence in the composition range in which the two-phase structure (cubic-TiN and wurtzite-AlN) developed and has been published in our earlier papers [6,7]. In these experiments a single phase c-TiAlN structure with Vshaped columnar morphology and 〈001〉 texture has been found at Ti/ Al ≥ 0.88.…”

Section: Introductionmentioning

confidence: 76%

“…With the target-substrate arrangement used in this facility (see Fig. 1 in [7]) only a small fraction of the vapour flux from the target section (directly below) arrives perpendicularly on the substrate, but the majority of vapour species is impinging at a certain angle with respect to the target-substrate axis. Therefore, tilted growth towards the vapour flux should be expected due to the oblique incident angles of the majority of the impinging metal species [17][18][19].…”

Section: Methodsmentioning

confidence: 99%

“…[7]. Since in our deposition facility tilted growth of columns towards the normal of the cathode was expected, the mechanical cutting of X-TEM specimens were taken from the radial axes of the samples as indicated in Figs.…”

Section: Methodsmentioning

confidence: 99%

“…However, in lack of the necessary structure information, the real mechanisms controlling the development of this complex structure and texture could not be given in Ref. [7]. An additional more complex and detailed structure analysis of the two-phase (Ti 1 − x Al x ) 1 − y Y y N films was strongly stimulated also by the hope that the description and understanding of the evolution of this complex structure could discover some new mechanisms and pathways of structure evolution which might have a general force in controlling the structure evolution of multi-component films.…”

Section: Introductionmentioning

confidence: 99%

“…[7]) with mixed c-TiN and w-AlN structure and crossover in the c-TiN texture. We intend to collect the basic characteristics of the structure, necessary to identify the fundamental phenomena of structure formation, operating during the structure evolution and their pathway in dependence of the deposition parameters [14,15].…”

Section: Introductionmentioning

confidence: 99%

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Crossover of texture and morphology in (Ti1−xAlx)1−yYyN alloy films and the pathway of structure evolution

Székely

Sáfrán

Kis

et al. 2014

Surface and Coatings Technology

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In our earlier published work, we have shown that there is a composition range of the (Ti 1 − x Al x ) 1 − y Y y N alloy films (0.72 b Ti/Al b 0.88) deposited at oblique vapour beam incidence and 500°C (corresponding to zone T) in which mixed cubic TiN (c-TiN) and wurtzite AlN (w-AlN) structures were formed together with an unusual complex texture. The texture of c-TiN phase changed from 〈001〉 to b111N at a certain thickness forming a definite crossover. Moreover the c-TiNb111N and the w-AlN〈0001〉 crystals were epitaxially related with axes tilted to the direction of the vapour beam. Based on a comprehensive transmission electron microscopy (TEM) and diffraction (XRD and selected area electron diffraction (SAED)) structure and morphology analysis, we discovered the details of this exotic structure making it possible to construct the complex pathway of structure evolution including the formation of the w-AlN phase and the change of the dominating texture of c-TiN phase with thickness in dependence of the Ti/Al ratio and the deposition parameters. This pathway could be deduced from the fundamental phenomena of structure formation and may be generalised for multi-component thin film systems. A composition structure zone model has been also proposed for the (Ti 1 − x Al x ) 1 − y Y y N thin film system in the 0 b x b 1 composition range.

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Section: Introductionmentioning

confidence: 76%

Section: Methodsmentioning

confidence: 99%

Section: Methodsmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

See 3 more Smart Citations

Crossover of texture and morphology in (Ti1−xAlx)1−yYyN alloy films and the pathway of structure evolution

Székely

Sáfrán

Kis

et al. 2014

Surface and Coatings Technology

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Impact Resistance and Properties of (Cr,Al,Si)N Coatings Deposited by Gas Flow Sputtering with Pulsed DC Supply

2021

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To increase the erosion and corrosion resistance of compressor blades, hard (Cr,Al,Si)N coatings are used. Physical vapor deposition (PVD) is a well‐known method for the deposition of nitride hard coatings. The application of pulse technique in power supply of conventional PVD technologies like magnetron sputtering shows a great potential for increasing the durability and lifetime of different tools and components. However, one disadvantage of conventional PVD is the line‐of‐sight characteristic. This is eliminated by means of the convection‐driven transport mechanism in high speed physical vapor deposition (HS‐PVD) technology, based on gas flow sputtering. Herein, the influence of gas flow sputtering with bipolar pulsed direct current (DC) power supply on coating properties and impact resistance of (Cr,Al,Si)N/substrate compound is investigated. Thereby, (Cr,Al,Si)N coatings are deposited onto X3CrNiMo13‐4 by HS‐PVD using continuous DC and bipolar pulsed DC supply. Nanoindentation analyses show an increase in indentation hardness using pulsed DC compared with continuous DC. Moreover, the lowest imprint depth and degree of cohesive and adhesive failures are observed in this case. These release a high potential for pulsed power supply in HS‐PVD, resulting in denser morphology, higher hardness and impact resistance compared with DC.

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Predicting the formation enthalpy and phase stability of (Ti,Al,TM)N (TM = III-VIB group transition metals) by high-throughput ab initio calculations and machine learning

Zhang,

Kong,

Chen

et al. 2024

Acta Materialia

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Influence of bipolar pulsed DC magnetron sputtering on elemental composition and micro-structure of Ti–Al–Y–N thin films

Cited by 26 publications

References 55 publications

Crossover of texture and morphology in (Ti1−xAlx)1−yYyN alloy films and the pathway of structure evolution

Crossover of texture and morphology in (Ti1−xAlx)1−yYyN alloy films and the pathway of structure evolution

Impact Resistance and Properties of (Cr,Al,Si)N Coatings Deposited by Gas Flow Sputtering with Pulsed DC Supply

Predicting the formation enthalpy and phase stability of (Ti,Al,TM)N (TM = III-VIB group transition metals) by high-throughput ab initio calculations and machine learning

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