Influence of argon and oxygen on charge-state-resolved ion energy distributions of filtered aluminum arcs

Rosén, Johanna; Anders, André; Mráz, Stanislav; Atiser, Adil; Schneider, Jochen M.

doi:10.1063/1.2206413

Cited by 33 publications

(33 citation statements)

References 24 publications

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“…It is known that IED can generally be approximated by a shifted Maxwellian distribution. [9][10][11] A characteristic feature of the Maxwellian distribution is the high energy tail, which makes E avg > E peak (see Table I). …”

Section: Resultsmentioning

confidence: 99%

Ion velocities in direct current arc plasma generated from compound cathodes

Zhirkov

Eriksson

Rosén

2013

Journal of Applied Physics

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Arc plasma from Ti-C, Ti-Al, and Ti-Si cathodes was characterized with respect to charge-stateresolved ion energy. The evaluated peak velocities of different ion species in plasma generated from a compound cathode were found to be equal and independent on ion mass. Therefore, measured difference in kinetic energies can be inferred from the difference in ion mass, with no dependence on ion charge state. The latter is consistent with previous work. These findings can be explained by plasma quasineutrality, ion acceleration by pressure gradients, and electron-ion coupling. Increasing the C concentration in Ti-C cathodes resulted in increasing average and peak ion energies for all ion species. This effect can be explained by the "cohesive energy rule," where material and phases of higher cohesive energy generally result in increasing energies (velocities). This is also consistent with the here obtained peak velocities around 1.37, 1.42, and 1.55 (10 4

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Section: Resultsmentioning

confidence: 99%

Ion velocities in direct current arc plasma generated from compound cathodes

Zhirkov

Eriksson

Rosén

2013

Journal of Applied Physics

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“…which is well known for streaming vacuum arc plasmas 14 . Fitting of (4) to the data gives values for the ion temperature and directed energy, and , from the width and shift of the distribution, respectively.…”

Section:  mentioning

confidence: 99%

Ion acceleration and cooling in gasless self-sputtering

Horwat

Anders

2010

Applied Physics Letters

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Copper plasma with hyperthermal directed velocity (8.8 eV) but very low temperature (0.6 eV) has been obtained using self-sputtering far above the runaway threshold. Ion energy distribution functions (IEDFs) were simultaneously measured at 34 locations. The IEDFs show the tail of the Thompson distribution near the magnetron target. They transform to shifted Maxwellians with the ions being accelerated and cooled. We deduce the existence of a highly asymmetric, pressure-driven potential hump which acts as a controlling “watershed” between the ion return flux and the expanding plasma.

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“…Absence of cathode surface reactions involving Ar excludes poisoning phenomena for this gas, and therefore aid in the interpretation of results from both an Ar and a N 2 atmosphere. The absence of a macroparticle filter excludes effects from a magnetic field on the plasma properties, 13,24 and therefore provides a base for fundamental understanding of arc plasma generation from Ti-Al compound cathodes in a reactive and non-reactive atmosphere.…”

Section: Introductionmentioning

confidence: 99%

Effect of N2 and Ar gas on DC arc plasma generation and film composition from Ti-Al compound cathodes

Zhirkov

Окс

Rosén

2015

Journal of Applied Physics

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Articles you may be interested inEffect of Ti-Al cathode composition on plasma generation and plasma transport in direct current vacuum arc J. Appl. Phys. 115, 123301 (2014); 10.1063/1.4869199Ion velocities in direct current arc plasma generated from compound cathodes J. Appl. Phys. 114, 213302 (2013) DC arc plasma from Ti, Al, and Ti 1Àx Al x (x ¼ 0.16, 0.25, 0.50, and 0.70) compound cathodes has been characterized with respect to plasma chemistry (charged particles) and charge-stateresolved ion energy for Ar and N 2 pressures in the range 10 À6 to 3 Â 10 À2 Torr. Scanning electron microscopy was used for exploring the correlation between the cathode and film composition, which in turn was correlated with the plasma properties. In an Ar atmosphere, the plasma ion composition showed a reduction of Al of approximately 5 at. % compared to the cathode composition, while deposited films were in accordance with the cathode stoichiometry. Introducing N 2 above $5 Â 10 À3 Torr, lead to a reduced Al content in the plasma as well as in the film, and hence a 1:1 correlation between the cathode and film composition cannot be expected in a reactive environment. This may be explained by an influence of the reactive gas on the arc mode and type of erosion of Ti and Al rich contaminations, as well as on the plasma transport. Throughout the investigated pressure range, a higher deposition rate was obtained from cathodes with higher Al content. The origin of generated gas ions was investigated through the velocity rule, stating that the most likely ion velocities of all cathode elements from a compound cathode are equal. The results suggest that the major part of the gas ions in Ar is generated from electron impact ionization, while gas ions in a N 2 atmosphere primarily originate from a nitrogen contaminated layer on the cathode surface. The presented results provide a contribution to the understanding processes of plasma generation from compound cathodes. It also allows for a more reasonable approach to the selection of composite cathode and experimental conditions for thin film depositions. V C 2015 AIP Publishing LLC.

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Influence of argon and oxygen on charge-state-resolved ion energy distributions of filtered aluminum arcs

Cited by 33 publications

References 24 publications

Ion velocities in direct current arc plasma generated from compound cathodes

Ion velocities in direct current arc plasma generated from compound cathodes

Ion acceleration and cooling in gasless self-sputtering

Effect of N2 and Ar gas on DC arc plasma generation and film composition from Ti-Al compound cathodes

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