2011
DOI: 10.1088/1742-6596/326/1/012020
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Influence of annealing temperature on the structural, optical and electrical properties of amorphous Zinc Sulfide thin films

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Cited by 10 publications
(7 citation statements)
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“…This is because when films are annealed they become less strained. Our calculated values of dislocation density and micro strain are close to those reported in literature [24][25][26][27][28].…”
Section: Methodssupporting
confidence: 89%
“…This is because when films are annealed they become less strained. Our calculated values of dislocation density and micro strain are close to those reported in literature [24][25][26][27][28].…”
Section: Methodssupporting
confidence: 89%
“…The average grain size was around 1430 nm for Se of a 157 nm thickness, which is depicted in figure 8 (a). Similar structures have been reported by Gode et al [49] for amorphous Zinc Sulphide thin films.…”
Section: Figure 7 Plot Of Energy Gap (Eg) Versus Thickness (T) For Se Thin Films Of Various Thicknessessupporting
confidence: 89%
“…One of the important parameters in deposition of thin films is the controlled annealing temperature. The annealing temperature plays a key role in electrical properties, which can affect the morphological structures and the hopping quantities [5]. For example, Pathirane et al [6] in 2017 investigated the effect of annealing temperature on the efficacy of the AZO/Ag nanowire junction, both structurally and electrically.…”
Section: Introductionmentioning
confidence: 99%