2019
DOI: 10.3390/coatings9120859
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Influence of Annealing Temperature on the Properties of ZnGa2O4 Thin Films by Magnetron Sputtering

Abstract: Zinc gallate (ZnGa2O4) thin films were grown on sapphire (0001) substrate using radio frequency (RF) magnetron sputtering. After the thin film deposition process, the grown ZnGa2O4 was annealed at a temperature ranging from 500 to 900 °C at atmospheric conditions. The average crystallite size of the grown ZnGa2O4 thin films increased from 11.94 to 27.05 nm as the annealing temperature rose from 500 to 900 °C. Excess Ga released from ZnGa2O4 during thermal annealing treatment resulted in the appearance of a Ga2… Show more

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Cited by 29 publications
(19 citation statements)
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“…The reason behind their lower luminescent intensity is the optical confinement of light due to planar interfaces [73]. Enhancing crystallinity of thin films then becomes an important issue and as a result of this issue, investigation of various parameters such as growth temperature, substrate species, oxygen pressure, and annealing temperature has taken place [74].…”
Section: Thin Films Of Znga 2 Omentioning
confidence: 99%
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“…The reason behind their lower luminescent intensity is the optical confinement of light due to planar interfaces [73]. Enhancing crystallinity of thin films then becomes an important issue and as a result of this issue, investigation of various parameters such as growth temperature, substrate species, oxygen pressure, and annealing temperature has taken place [74].…”
Section: Thin Films Of Znga 2 Omentioning
confidence: 99%
“…PLD exhibits significant advantages, such as the stoichiometry of deposited films close to that of the target, high deposition rate, low contamination level [71], precise arrival rates of atoms for compound films, and the ability to operate in high-pressure reactive gases [77]. In fact, RF magnetron sputtering has been the most successful among the various growth techniques for wide-area applications due to its easy controllability of the growth parameters, excellent packing density [74], strong adhesion, excellent film thickness uniformity, and relatively low running cost [78]. Polycrystalline or amorphous film structures are usually obtained by the RF magnetron sputtering method, which significantly affects the optoelectronic properties of the material [74].…”
Section: Thin Films Of Znga 2 Omentioning
confidence: 99%
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“…15 While ZGO has been grown and researched as a single crystal grown from flux [16][17][18] since the late 1960's, most previously published work focused on thin films, ceramics, and polycrystalline samples. 13,[19][20][21][22] Phonon modes are of basic interest for understanding carrier and heat transport, or photo excitation processes, for example. While some information on infrared (IR)-active as well as Raman-active modes was reported, a complete set of IR-active transverse (TO) and longitudinal optical (LO) phonon modes in ZGO is not available yet.…”
mentioning
confidence: 99%