Influence of Al addition on phase transformation and thermal stability of nickel silicides on Si(001)

Huang, Shu-Hsien; Twan, Sheng Chen; Cheng, Sheng-Tzong; Lee, Tu; Hu, Jiumei; Chen, Lien Tai; Lee, Sheng Wei

doi:10.1016/j.jallcom.2013.02.133

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Cited by 3 publications

(2 citation statements)

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“…The Ni:Si ratio is also according with ␦-Ni 2 Si phase. Huang et al pointed out that Al tended to substitute Si atoms in bulk Ni-Si alloy [30] to form ␦-Ni 2 Si 1−x Al x . The remaining layers include Ni, Si, Mo, Ti, V, Cr, Mn and Co.…”

Section: Resultsmentioning

confidence: 99%

Comparison of microstructure and oxidation behavior between Pt-free and Pt-modified δ-Ni 2 Si coatings on Ni-based superalloys

Wang

Ren

et al. 2015

Corrosion Science

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Section: Resultsmentioning

confidence: 99%

Comparison of microstructure and oxidation behavior between Pt-free and Pt-modified δ-Ni 2 Si coatings on Ni-based superalloys

Wang

Ren

et al. 2015

Corrosion Science

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“…At the same time, the appearance of Al expects to decrease the Gibbs free energy of the NiSi 2−x Al x phase, NiSi 2−x Al x /Si interfacial energy, and stabilize the NiSi 2−x Al x phase, similar to the case of NiAl alloy on the formation of silicide. 15) We propose that the reduced Ni diffusion and the modified energetics induce the uniform ternary NiSi 2−x Al x layer formation with flat interface on Si(001) substrate.…”

mentioning

confidence: 93%

Formation of uniform and homogeneous ternary NiSi_2−xAl _x on Si(001) by an Al interlayer mediation

Kai¹,

Ping²,

Liu³

et al. 2019

Appl. Phys. Express

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Ternary NiSi2−xAlx layer with uniform and smooth NiSi2−xAlx/Si interface has been achieved by Al interlayer mediated epitaxy. A 3 nm Al interlayer is introduced to the Nickel silicidation on Si(001) substrate. The morphology, composition, and micro-structure of the Ni silicide layers are analyzed for different annealing temperatures. It is found that under the assistance of Al atoms, the best quality Ni silicide layer is achieved by annealing at 700 °C. The reduced Ni diffusion and the modified energetics are conducive for the uniform reaction between Ni and Si, resulting in epitaxial ternary NiSi2−xAlx layer on Si(001) substrate.

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In situ TEM study of Ni-silicides formation up to 973K

Dodony

Rečnik

Dódony

et al. 2022

Journal of Alloys and Compounds

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Influence of Al addition on phase transformation and thermal stability of nickel silicides on Si(001)

Cited by 3 publications

References 30 publications

Comparison of microstructure and oxidation behavior between Pt-free and Pt-modified δ-Ni 2 Si coatings on Ni-based superalloys

Comparison of microstructure and oxidation behavior between Pt-free and Pt-modified δ-Ni 2 Si coatings on Ni-based superalloys

Formation of uniform and homogeneous ternary NiSi_2−xAl _x on Si(001) by an Al interlayer mediation

In situ TEM study of Ni-silicides formation up to 973K

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Influence of Al addition on phase transformation and thermal stability of nickel silicides on Si(001)

Cited by 3 publications

References 30 publications

Comparison of microstructure and oxidation behavior between Pt-free and Pt-modified δ-Ni 2 Si coatings on Ni-based superalloys

Comparison of microstructure and oxidation behavior between Pt-free and Pt-modified δ-Ni 2 Si coatings on Ni-based superalloys

Formation of uniform and homogeneous ternary NiSi2−x Al x on Si(001) by an Al interlayer mediation

In situ TEM study of Ni-silicides formation up to 973K

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Product

Resources

About

Formation of uniform and homogeneous ternary NiSi_2−xAl _x on Si(001) by an Al interlayer mediation