Abstract:To clarify a factor on the reliability, we investigated the characteristics of carbon-doped indium oxide (InO1.16C0.04) thin-film transistors by varying the O2 concentration from 0.001% to 100% at atmospheric pressure under negative bias stress (NBS) and positive bias stress (PBS). A positive threshold voltage (V
th) shift was observed when the bias stress was changed from NBS to PBS. The positive V
th shift increased with increasing bias voltage irrespective of the O2 conce… Show more
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