Influence du vieillissement d'une solution renfermant un polystyrène silicié et un sel de triarylsulfonium sur le pourcentage de coupure des liaisons OSi sous irradiation ultraviolette et en couche mince

Abstract

Upon treatment with ultraviolet irradiation (wavelength A = 254 nm) the resist containing both poly@-trialkylsiloxystyrene) and a triarylsulfonium salt undergoes photoinduced structural modifications which convert the silylated polymer into either poly@-hydroxystyrene) or poly[@-trialkylsiloxystyrene)-co-~-hydroxystyrene)]. Aging with the use of antimonate salts rather than arsenate salts, and bulky alkyl groups favour 0-Si bond cleavage.