1984
DOI: 10.1103/physrevb.29.3733
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Inelastic electron scattering mechanisms in clean aluminum films

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Cited by 119 publications
(53 citation statements)
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“…The values for inelastic scattering correspond to measurements by Santanam et al, 55 who found in ϭ0.2-1.0 ns in 10-nm Al films at 4.2 K, and Van Son et al 54 who found in ϭ0.8-0.9 ns in 7-nm Al films at T cAl . Our values of in ϭ0.9 ns at 1.6 K and 0.3 ns at 4.2 K indicate a scaling with T Ϫ1 rather than T Ϫ3 , which was found and discussed as well by Santanam et al 55 Note that the values for the inelastic scattering are much smaller than k B T, which means that the stationary properties are not influenced by in .…”
Section: Application: the Nature Of The Intrinsic Shuntsupporting
confidence: 88%
“…The values for inelastic scattering correspond to measurements by Santanam et al, 55 who found in ϭ0.2-1.0 ns in 10-nm Al films at 4.2 K, and Van Son et al 54 who found in ϭ0.8-0.9 ns in 7-nm Al films at T cAl . Our values of in ϭ0.9 ns at 1.6 K and 0.3 ns at 4.2 K indicate a scaling with T Ϫ1 rather than T Ϫ3 , which was found and discussed as well by Santanam et al 55 Note that the values for the inelastic scattering are much smaller than k B T, which means that the stationary properties are not influenced by in .…”
Section: Application: the Nature Of The Intrinsic Shuntsupporting
confidence: 88%
“…24 The sample fabrication has already been described in detail elsewhere. 31 The measurements were performed in a 3 He/ 4 He dilution refrigerator. The electrons in the SOI film were heated above the lattice temperature by electric current.…”
Section: Samples and Thermometrymentioning
confidence: 99%
“…The possible acoustic mismatch is negligible between heavily doped silicon and SiO 2 due to the acoustic similarity of these materials and it is reasonable to assume that electrons interact with 3D phonons. Heavily doped Si investigated in the present work is in the dirty limit at subKelvin temperature and the phonon system has a complete phonon drag, therefore according to the theory 5,27,29 the electronphonon interaction relaxation time e-ph Ϫ1 is supposed to be proportional to T 4 .…”
Section: Introductionmentioning
confidence: 98%
“…In Section VI.B we identified the source of the resistivity in the superconducting state as being due to the position-dependent density n f (x) and movement of free vortices due to the Lorentz force. In this analysis we have simplified the description by working with a local electron temperature and a local density (Santhanam and Prober, 1984). The electron-electron scattering length is defined as Λee = √ Dτee, and the coherence length ξ given by √ ξ0l…”
Section: Distributed Superconducting Order Parameter Model: If Banmentioning
confidence: 99%
“…In interpreting the results demonstrated for HEBs of different materials under these bias conditions, we first need to take into account the length L of the device in comparison to the characteristic lengths for the microscopic processes. A summary of relevant length scales for different materials is given in Table III, mainly provided to facilitate a translation from aluminum results to an application to niobium-nitride devices. Aluminium has a very long coherence length and a very long electron-electron interaction length, of the order of 1 µm (depending on temperature and resistance per square (Santhanam and Prober, 1984)). Hence, one can easily be in the regime L << ξ, Λ ee , like in the case of hot-electron bolometers studied by Prober 21 (Prober, 1993) and Siddiqi et al (Siddiqi et al, 2002).…”
Section: Distributed Superconducting Order Parameter Model: If Banmentioning
confidence: 99%