Industrial photoresist development with the EUV laboratory exposure tool: mask fabrication, sensitivity and contrast

Extreme Ultraviolet Radiation Sources from Dense Plasmas

“…Currently, utilizing extreme ultraviolet lithography to produce more powerful semiconductor chips is the most important application, which has driven the development of optics and a compact light source for the wavelength of 13.5 nm [1]. Other examples of applications making use of compact light sources are in the field of EUV lithography, i.e., use for mirror contamination studies [2][3][4], qualification of optical elements and masks [5][6][7][8][9][10][11] or photo resist development [12,13]. Further examples are X-ray microscopy in the spectral range of the water window (2.4-4.4 nm) for the imaging of biological samples in their natural wet environment [14][15][16][17][18] or XUV-based reflectometry for surface analysis [19,20].…”