2011
DOI: 10.1063/1.3597301
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Induced magnetic anisotropy in lifted (Ga,Mn)As thin films

Abstract: We demonstrate the ability to release the growth-induced strain in (Ga,Mn)As layers and (In,Ga)As/(Ga,Mn)As bilayers by lifting them from the GaAs substrate. The lifted (bi)layers are then deposited back onto various substrates. The change in strain before and after processing has been studied by means of x-ray diffraction. Magnetic characterization demonstrates the efficiency of our lift-off process to reorient the magnetization to the direction normal to the layer plane.

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Cited by 2 publications
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“…However, the synthesis of (Ga,Mn)As done using low‐temperature molecular beam epitaxy (LT‐MBE), whereby (Ga,Mn)As is grown with atom layer precision on lattice‐matched substrate, restricting its integration with some main‐stream semiconductors, and flexible applications. By using an epitaxial lift‐off (ELO) technique proposed by Yablonovitch et al, a 70 nm thick (Ga,Mn)As film has been lifted‐off from the epitaxial substrate . However, peeling off nanometer‐thick (Ga,Mn)As layer and making its vdWs heterostructure device with other layered materials remain elusive.…”
mentioning
confidence: 99%
“…However, the synthesis of (Ga,Mn)As done using low‐temperature molecular beam epitaxy (LT‐MBE), whereby (Ga,Mn)As is grown with atom layer precision on lattice‐matched substrate, restricting its integration with some main‐stream semiconductors, and flexible applications. By using an epitaxial lift‐off (ELO) technique proposed by Yablonovitch et al, a 70 nm thick (Ga,Mn)As film has been lifted‐off from the epitaxial substrate . However, peeling off nanometer‐thick (Ga,Mn)As layer and making its vdWs heterostructure device with other layered materials remain elusive.…”
mentioning
confidence: 99%