Induced bistability into quartz glass by silicon wafer heat treatment  in lamp-based reactor

Prigara, Valeriya P.; Ovcharov, V. V.

doi:10.1117/12.2521891

Cited by 1 publication

(6 citation statements)

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“…The energy equations for thermal transfer between gray surfaces in such a thermal system are set up and solved in [16]. In [16] combined heat transfer is simulated in the radiative-closed thermal system. Besides radiative heat transfer in which all plates of the system take part, an extra heat removal is considered.…”

Section: Basic Equationsmentioning

confidence: 99%

“…2 q q − , correspondingly, then the set of equations for the heat transfer in the thermal system modeling lamp-based chamber [16] can be rewritten as…”

Section: Basic Equationsmentioning

confidence: 99%

“…The gray surfaces approximation used in [16] is crude enough to describe thermal radiation heat transfer in the lamp-based chamber with regard to quartz glass window influence. The restriction of the upper bound of the heater radiation is exclusively spectral effect.…”

Section: Basic Equationsmentioning

confidence: 99%

“…The restriction of the upper bound of the heater radiation is exclusively spectral effect. So, we refine the gray approximation [16] by the spectral one:…”

Section: Basic Equationsmentioning

confidence: 99%

“…( ) The following study is focused on the effect of the spectral characteristics of the silicon wafer and quartz glass plate on the heat transfer. Let us consider the problem in the first approximation when the heater and absorber plates possess optical properties of the blackbody (ABB) ( are given by the same formulas as well as for the corresponding total characteristics in [16]…”

Section: Basic Equationsmentioning

confidence: 99%

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The Effect of Quartz Window on Bistability of the Silicon Wafer in Lamp-Based Reactor

Prigara¹,

Kupriyanov²,

Ovcharov³

2020

MSCE

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The effect of a quartz plate (window) on the silicon wafer temperature is studied in the conditions of the combined thermal transfer in a lamp-based chamber for the rapid thermal treatment (RTP) set up. The chamber for RTP is simulated by a radiative-closed thermal system including the influence of quartz window as a spectral filter of lamp emission and a source of emitted thermal radiation. Energy equations for thermal fluxes involved in the heat input and output from the working wafer and quartz window are solved in spectral approximation. The transfer characteristics that are defined by the temperature dependencies of the silicon wafer and the quartz window on the temperature of the heater are accounted. It is shown that temperature bistability in the silicon wafer initiates an induced bistability into the quartz window that does not reveal bistable behavior because of the linear temperature dependence of its total optical characteristics. A possibility for simulation of the quartz window by spectral restriction of the heater radiation is confirmed. The availability of the weak bistable effect in the mode of zero effective heat exchange coefficient of a non-radiative component of the thermal flux removed from the working wafer has been obtained.

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Section: Basic Equationsmentioning

confidence: 99%

“…2 q q − , correspondingly, then the set of equations for the heat transfer in the thermal system modeling lamp-based chamber [16] can be rewritten as…”

Section: Basic Equationsmentioning

confidence: 99%

Section: Basic Equationsmentioning

confidence: 99%

“…The restriction of the upper bound of the heater radiation is exclusively spectral effect. So, we refine the gray approximation [16] by the spectral one:…”

Section: Basic Equationsmentioning

confidence: 99%

Section: Basic Equationsmentioning

confidence: 99%

See 3 more Smart Citations